7049-25-4 Usage
Uses
Used in Organic Synthesis:
1-SILA-3-CYCLOPENTENE 95% is used as a building block for the synthesis of various organic and silicon-based compounds. Its unique structure allows for the formation of new chemical bonds and the creation of a wide range of molecules.
Used in Silicon-Containing Polymers:
1-SILA-3-CYCLOPENTENE 95% is used as a precursor in the creation of silicon-containing polymers. These polymers have unique properties, such as thermal stability and resistance to environmental factors, making them suitable for various applications.
Used in Pharmaceutical Industry:
1-SILA-3-CYCLOPENTENE 95% is used as a reagent in the pharmaceutical industry. Its unique chemical properties make it a valuable component in the development of new drugs and pharmaceutical compounds.
Used in Research and Development:
1-SILA-3-CYCLOPENTENE 95% is used in research and development for the exploration of new chemical reactions and the synthesis of novel compounds. Its unique structure and reactivity make it a valuable tool for scientists and researchers in the field of chemistry.
Check Digit Verification of cas no
The CAS Registry Mumber 7049-25-4 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 7,0,4 and 9 respectively; the second part has 2 digits, 2 and 5 respectively.
Calculate Digit Verification of CAS Registry Number 7049-25:
(6*7)+(5*0)+(4*4)+(3*9)+(2*2)+(1*5)=94
94 % 10 = 4
So 7049-25-4 is a valid CAS Registry Number.
InChI:InChI=1/C4H8Si/c1-2-4-5-3-1/h1-2H,3-5H2
7049-25-4Relevant academic research and scientific papers
Laser-powered homogeneous pyrolysis of 4-silaspiro[3,3]heptane. A source for 2-silaallene and its polymer
Urbanova,Volnina,Gusel'nikov,Bastl,Pola
, p. 73 - 76 (2007/10/03)
Continuous-wave CO2 laser-photosensitized (SF6) decomposition of 4-silaspiro[3.3]heptane is dominated by the transient formation and polymerization of 2-silaallene. The first experimental evidence for 2-sihiallene has been achieved via scavenging with alcohols ROH (R = CH3. CF3CH2) to afford dialkoxy(dimethyl)silanes. (RO)2Si(CH3)2. ESCA analysis of the polymer demonstrates SiC2 stoichiometry and indicates the incorporation of oxygen, which may be explained by reaction of the residual Si=C bonds with air.
Shock-induced kinetics of the disilane decomposition and silylene reactions with trimethylsilane and butadiene
Dzarnoski,Rickborn,O'Neal,Ring
, p. 1217 - 1220 (2008/10/08)
The homogeneous gas-phase decomposition kinetics of disilane have been studied by the comparative rate, single-pulse shock-tube technique in the 850-1000 K (2300-2700 torr) ranges. Two primary dissociation processes occur, Si2H6-i SiH4/su
