7327-60-8

Usage

Flammability and Explosibility

Nonflammable

InChI:InChI=1/C6H6N4/c7-1-4-10(5-2-8)6-3-9/h4-6H2

Upstream product

• 50-00-0 formaldehyd 
• 143-33-9 sodium cyanide 
• 151-50-8 potassium cyanide 
• 1116-43-4 methanediyldiimino-tetra-acetonitrile 
• 74-90-8 hydrogen cyanide 
• 100-97-0 hexamethylenetetramine 
• 107-16-4 glycolonitrile 
• 540-61-4 2-aminoacetonitrile 
• 628-87-5 iminodiacetonitrile 
• 7647-01-0 hydrogenchloride 
• 590-17-0 cyanomethyl bromide 

Downstream Products

• 139-13-9 nitrilotriacetic acid 
• 68926-25-0 nitrilotri-acetic acid tricyclohexyl ester 
• 24553-06-8 4-(carbamoylmethyl)piperazine-2,6-dione 
• 4862-18-4 nitrilotriacetic acid triamide 
• 142-73-4 iminodiacetic acid 
• 75472-28-5 tris(2-benzothiazolylmethyl)amine 

Relevant academic research and scientific papers

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising recurring units containing a non-leaving hydroxyl group represented by formula (1) wherein R1 is H, methyl or trifluoromethyl, X is a single bond or methylene, m is 1 or 2, and the hydroxyl group attaches to a secondary carbon atom. The composition is improved in resolution when processed by lithography.

Novel tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process

Novel tertiary (meth)acrylate compounds having a lactone structure are polymerizable into polymers having improved transparency, especially at the exposure wavelength of an excimer laser and dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, have a high resolution, and lend themselves to micropatterning with electron beams or deep-UV rays.

Amine compounds, resist compositions and patterning process

Amine compounds having a cyano group are useful in resist compositions for preventing a resist film from thinning and also for enhancing the resolution and focus margin of resist.

Continuous process for the cyanoalkylation of compounds having one or more NH functions

The invention relates to a continuous process, carried out in two steps, for the cyanoalkylation of compounds having one or more NH functions by reaction thereof with carbonyl compounds and hydrocyanic acid, in which the first step is carried out without pressure at a temperature which is below the boiling point of the reaction mixture.

EQUILIBRIUM OF α-AMINOACETONITRILE FORMATION FROM FORMALDEHYDE, HYDROGEN CYANIDE AND AMMONIA IN AQUEOUS SOLUTION: INDUSTRIAL AND PREBIOTIC SIGNIFICANCE

The equilibrium constant, Kan(H2CO), for the formation of α-aminoacetonitrile from formaldehyde, ammonia and hydrogen cyanide was evaluated at 25 deg C.A first estimation of Kan(H2CO) was obtained from extrathermodynamic relationships of the type log K' vs Σ?*.The final value was then obtained from a comparison of the experimental and calculated pH dependences of α-hydroxy- and α-aminoacetonitrile concentrations.From these results, it appears that, after equilibrium, the ratio between the concentrations of the two precursors glycine and hydroxyethanoic acid, is a linear function of the concentration of free ammonia, i.e. /=21 at 25 deg C.

Process for preparing nitrilotriacetonitrile

The preparation of methylene-bis-iminodiacetonitrile and nitrilotriacetonitrile by the reaction of formaldehyde, ammonia and hydrogen cyanide under acidic conditions involving a particular procedure of adding hydrogen cyanide to an acidified liquid phase adduct of ammonia and formaldehyde; the preparation of nitrilotriacetonitrile from methylene-bis-iminodiacetonitrile; and the preparation of nitrilotriacetic acid from methylene-bis-iminodiacetonitrile by carboxymethylation under alkaline conditions. Nitrilotriacetonitrile is particularly useful in the formation, by hydrolysis, of nitrilotriacetic acid of particular value as a chelating or complexing agent.