Structural and electrical properties of radio frequency magnetron sputtered tantalum oxide films: Influence of post-deposition annealing

Add time:08/01/2019    Source:sciencedirect.com

The as-deposited and annealed radio frequency reactive magnetron sputtered tantalum oxide (Ta2O5) films were characterized by studying the chemical binding configuration, structural and electrical properties. X-ray photoelectron spectroscopy and X-ray diffraction analysis of the films elucidate that the film annealed at 673 K was stoichiometric with orthorhombic β-phase Ta2O5. The dielectric constant values of the tantalum oxide capacitors with the sandwich structure of Al/Ta2O5/Si were in the range from 14 to 26 depending on the post-deposition annealing temperature. The leakage current density was <20 nA cm−2 at the gate bias voltage of 0.04 MV/cm for the annealed films. The electrical conduction mechanism observed in the films was Poole–Frenkel.

We also recommend Trading Suppliers and Manufacturers of BARIUM TANTALUM OXIDE (cas 12047-34-6). Pls Click Website Link as below: cas 12047-34-6 suppliers

Prev:Cerium doped barium tantalates: Fabrication, characterization, and investigation of gamma radiation attenuation
Next:Bismuth oxyfluoride @ CMK-3 nanocomposite as cathode for lithium ion batteries)