Lithium storage performance of copper nitride films deposited by reactive DC magnetron sputtering
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Add time:08/24/2019 Source:sciencedirect.com
Copper nitride (Cu3N) films were deposited on copper foil substrates by reactive direct current (DC) unbalance magnetron sputtering. The Cu3N films with DC sputtering powers of 110, 205, 280 and 373 W under the mixture of argon (Ar) and nitrogen (N2) gases were investigated. The dependence of crystalline structure and film thickness of Cu3N on the sputtering powers was evaluated. Exclusively, the electrochemical measurements of the films in 1M LiCl as electrolyte were also carried out. The good performance of lithium ion storage was observed. These results demonstrate that Cu3N film on copper foil could be further explored as high capacity material for flexible lithium ion battery development.
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