Regular ArticleFirst conductive atomic force microscopy investigation on the oxide-film removal mechanism by chloride fluxes in aluminum brazing

Add time:08/22/2019    Source:sciencedirect.com

In the paper, conductive atomic force microscopy (CAFM) technique was used, for the first time, to obtain direct evidence of oxide-film removal during fluxing, via measuring the electrical conductivity of aluminum sample surfaces. The CAFM results show that the F− ions from the flux loosened the film, forming micro cracks on the oxide film. Subsequently, the Zn2 + ions permeated into the film through the cracks and chemically reacted with the aluminum substrate, destroying the bonding between the oxide layer and the aluminum substrate. These important findings pave the way for developing Cl-free environment-friendly fluxes for industrial applications.

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