The pressure dependence of the thermal diffusion factor of the system He-Octafluorocyclobutane (cas 115-25-3) at 300 K

Add time:08/28/2019    Source:sciencedirect.com

Thermal diffusion factors, αT, are reported for the system He-octafluorocyclobutane at 300 K as functions of concentration and pressure; some data are also reported for the system He-n-C4H10. The experimental values are extrapolated to zero pressure and the data used to predict the pressure dependence of αT at each concentration by means of theory of Oost, Los, Cauwenbergh and van Dael.

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