Sensitization of track etching in CR-39 by copolymerization with methacryloyl-L-ALANINE METHYL ESTER (cas 114041-77-9)
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Add time:09/02/2019 Source:sciencedirect.com
Copolymer films of diethyleneglycol-bis-allylcarbonate (monomer of CR-39) and selected volume percentages of methacryloyl-L-alanine methyl ester (MA-L-AlaOMe) between 5 and 60% were irradiated with Au ions of 13 MeV nucl-1 and etched in NaOH solution at 60°C. Sensitization of track etching was observed for NaOH concentrations of 4 and 6 N. The maximum reduced etch-rate ratio, Vt/Vb-1, was obtained for the copolymer of 90% of CR-39 monomer and 10% of MA-L-AlaOMe at 4 N NaOH, which was 3.6 times higher than that for pure CR-39. The sensitization was accompanied by an increase in Vb so that the etching time could be reduced to ca 1/30 in comparison with that for pure CR-39.
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