Plasma deposited high density amines on surface using (3-aminopropyl)triethoxysilane for assembling particles at sub-nano size

Add time:09/03/2019    Source:sciencedirect.com

Although solid particles assembling on substrate surface is one of the key points for developing membrane reactors, the technology of organizing nano/sub nanometer building blocks into complex structures is still a challenge to scientists in years. In this work, amine functional groups were deposited on the surface of different substrates via plasma enhanced chemical vapor deposition (PECVD) technology and (3-aminopropyl)triethoxysilane monomers were used as precursors. The influence of active gas, substrates, as well as deposition time on the physico-chemical features of as-deposited film were investigated, respectively. The highest density of amine of 5.5% on surface was obtained when Ar was utilized as active gas and deposition time was 40 s. Furthermore, Y type zeolite particles at sub-nano size were synthesized and subsequently used as a model material for testing the immobilizing ability of plasma treated surface. The results clearly confirmed that a dense mono or multi-layer of closely packed zeolite particles could be formed on the APTES as-deposited surface after 24 hours’ immersion and the surface area of substrate could be improved by the deposition of zeolite.

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