Organic Letters
Letter
1,1,1-trifluoroethane (CF3CH2Cl),17 and 1,1-dichloro-2,2,2-
trifluoroethane (CF3CHCl2),6,18 via a single-electron transfer
(SET) process has been achieved. Notably, we have already
realized the sulfinatodehalogenation of CF3CH2I to generate
the CF3CH2 radical and its subsequent reactions with various
unactivated alkenes.19 Moreover, the photocatalytic activation
of CF3CH2I can efficiently afford the corresponding CF3CH2
radical, which can react with styrenes to afford the desired γ-
trifluoromethyl alcohols in the presence of an oxygen source
(Figure 1b),20 or with aryl silyl enol ethers to produce the
corresponding β-CF3-substituted ketones (Figure 1c).21 As a
continuation of our research interest in the activation and
radical reactions of CF3CH2I, we have currently investigated
the activation of CF3CH2I and its subsequent radical reactions
with styrenes under a cobalt catalyst. Without the addition of
an extra hydrogen source, addition of the generated CF3CH2
radical to styrenes proceeded smoothly to produce a new
radical intermediate and its self-coupling finished the
corresponding trifluoroethylation self-coupling products in
high yields. Interestingly, in the presence of both thiophenol
and tris(trimethylsilyl)silane as an extra hydrogen source, high
yields of the desired hydrotrifluoroethylated products were
obtained.
Our study commenced by using 4-vinylbiphenyl (1a) as the
model substrate, CF3CH2I as the trifluoroethyl source, and
zinc powder as the reductant at room temperature for 6 h in
acetone. Initially, we investigated the influence of different
metal salts as a catalyst with the assistance of PPh3 as the
ligand (see Table S1 for details). However, instead of the
desired hydrotrifluoroethylation product, trifluoroethylation
self-coupling product 2a was obtained. We tested the effect of
CF3CH2I loading, various catalysts, and their loadings and
found that 0.6 equiv of CoCl2 combined with 1.5 equiv of
CF3CH2I afforded the best yield of 2a.
of 4-vinylbiphenyl (1a) as the substrate resulted in a good yield
of 2a of 82%, which is a 1:1 mixture of two diastereomers.
After repeat flash column chromatography and preparative thin
layer chromatography on silica gel, they can be successfully
separated and diastereomer 2a″ was unambiguously assigned
by X-ray crystallographic analysis.22 Other substrates contain-
ing various groups, including methyl, methoxy, and fluorine, on
the aromatic ring are all applicable to the reactions, affording
the target products in nice yields.
Aiming at hydrotrifluoroethylation of vinylbiphenyl 1a, we
continued to examine screening conditions by adding an extra
CoBr2 and PPh3 stood out as the best catalyst combination and
were used in the radical hydrotrifluoroethylation reactions (see
hydrogen source that came to our mind was thiol because it is
known that an alkyl radical can readily abstract a hydrogen
from thiol.23 After examining various thiols, we found
thiophenol (PhSH) performed best and the desired hydro-
trifluoroethylation product 3a was successfully obtained (see
Table S4 for details). To our delight, the use of 1.0 equiv of
thiophenol efficiently suppressed the formation of self-coupling
product 2a, but another byproduct 4 was generated obviously
due to the combination of benzyl radical and phenylthio
radical generated in the reaction system (Figure 5). A further
increase in thiophenol loading resulted in more byproduct 4,
and the same yield of desired product 3a was observed (see
mentioning that the direct reaction of the CF3CH2 radical with
PhSH to give PhSCH2CF3 in the reaction mixture was
observed by 19F NMR spectroscopy.
Next, we considered adding a second extra hydrogen source
to transfer the phenylthio radical back to thiophenol to
suppress the formation of side product 4. We chose
tris(trimethylsilyl)silane [(Me3Si)3SiH] because the alkyl
radical generated from addition of the CF3CH2 radical with
styrene is not prone to abstracting the hydrogen from
(Me3Si)3SiH, while the phenylthio radical can readily abstract
the hydrogen of (Me3Si)3SiH. We then investigated the
influence of its loading (see Table S7 for details). Fortunately,
it was observed that (Me3Si)3SiH did effectively suppress the
production of 4. The more (Me3Si)3SiH we used, the less
byproduct 4 we obtained. Although utilization of 1.0 equiv of
(Me3Si)3SiH almost completely eliminated byproduct 4, it was
found that some starting styrene was still not consumed. To
improve the yield of desired product 3a, we further
investigated the loading of CF3CH2I and Zn powder used
(see Table S7 for details). We found that 1.5 equiv of Zn
powder and 3.0 equiv of CF3CH2I afforded the best yield of
88%. On the basis of all of the screening results mentioned
above, the optimized conditions for the cobalt-catalyzed radical
trifluoroethylation of styrenes were set as follows: styrene (1.0
equiv), CF3CH2I (3.0 equiv), CoBr2 (0.2 equiv), PPh3 (0.8
equiv), Zn (1.5 equiv), PhSH (1.0 equiv), (Me3Si)3SiH (1.0
equiv), acetone, Ar atmosphere, room temperature, 12 h.
With optimized reaction conditions established, we then
investigated the scope of various styrenes for the cobalt-
catalyzed radical hydrotrifluoroethylation reactions (Figure 3).
We first studied the hydrotrifluoroethylation of substrates 1c−
1j bearing electron-donating substituents on the aromatic ring.
Compounds bearing methyl, tert-butyl, methoxy, hydroxyl,
amino, and acetoxy substituents on the benzene core at meta or
para positions afforded the desired products in moderate to
With the optimal conditions for product 2 in hand, several
styrenes were subjected to the cobalt-mediated trifluoroethy-
lation self-coupling reactions. As shown in Figure 2, utilization
Figure 2. Trifluoroethylation self-coupling reactions of various
styrenes. Reaction conditions: 1 (0.5 mmol, 1.0 equiv), CF3CH2I
(0.75 mmol, 1.5 equiv), Zn (1.0 mmol, 2.0 equiv), CoCl2 (0.3 mmol,
0.6 equiv), PPh3 (1.2 mmol, 2.4 equiv), acetone (5 mL), rt, 12 h, Ar
a
atmosphere. Isolated yields are shown. The yield was determined by
19F NMR spectroscopy with trifluorotoluene as an internal standard
and 1H NMR spectroscopy using dibromomethane as an internal
standard.
B
Org. Lett. XXXX, XXX, XXX−XXX