C O M M U N I C A T I O N S
Scheme 2
Scheme 3a
1.7) are lower compared to results for hexene homopolymerization
under identical conditions. The copolymers contain 90-100
branches/1000 C (60% Me, 20% Bu > long > Et > Pr), which is
similar to what is observed in control hexene homopolymeriza-
tions.10 NMR data establish that the major comonomer units in the
copolymers are CH3CH(OSiPh3)CH2- (I, 85%) and CH2(OSiPh3)-
CH2- (II, 6%).
The following lines of evidence establish that the poly(hexene-
co-CH2dCHOSiPh3) is a copolymer and does not contain -[CH2-
CHOSiPh3]n- homopolymer. (i) As noted above, 1c is not
polymerized by (R-diimine)PdMe+ under these conditions. (ii) If
-[CH2CHOSiPh3]n- had formed, it would be removed by the
workup procedure, since it is soluble in acetone but not hexane.
(iii) NMR spectra of the copolymer do not contain the characteristic
broad resonances of -[CH2CHOSiPh3]n-. (iv) HMBC NMR data
establish that the -OSiPh3 units of the copolymer are covalently
linked to the polyhexene chain.
a P ) growing chain.
OSiPh3 group in (R-diimine)Pd(CH2dCHOSiPh3)P+ species may
inhibit this process, so that 2,1 insertion becomes competitive in
1c copolymerization. The “in-chain” placement III may be dis-
favored for 1c because the (R-diimine)PdCH2CH(OSiPh3)P+ and
(R-diimine)PdCH(OSiPh3)CH2P+ species generated by insertion of
1c are too crowded to readily insert olefins.
In summary, silyl vinyl ethers are readily incorporated in hexene
insertion polymerization catalyzed by (R-diimine)PdMe+ and the
mode of incorporation is influenced by the structure of the OSiR3
group. The copolymers can be desilylated to produce hexene/CH2d
CHOH copolymers. Monomer 1c has also been copolymerized with
other olefins ranging from ethylene to 1-octadecene. We anticipate
that silyl vinyl ethers will be suitable comonomers for other olefin
polymerization catalysts, and our studies in this direction will be
reported in due course.
The 1-hexene/1c copolymer was desilylated by reaction with HCl
(CHCl3, 2 d; 94% conversion of OSiPh3 groups to OH groups).
The NMR spectra of the desilylated copolymer were unchanged
after elution through SiO2 with hexanes, which would remove any
-[CH2CHOH]n- (if present). This result confirms that the hexene/
1c copolymer does not contain -[CH2CHOSiPh3]n-.
Acknowledgment. This work was supported by the U.S.
Department of Energy (Grant DE-FG-02-00ER15036).
The reaction of 1-hexene/1b mixtures with (R-diimine)PdMe+
generates mixtures of -[CH2CHOSiMe3]n- homopolymer and
1-hexene/CH2dCHOSiMe3 copolymers containing up to 11 mol
% comonomer. The consumption of hexene is significantly
decreased compared to control hexene homopolymerizations under
identical conditions due to the Pd0 formation associated with the
cationic polymerization of 1b. The -[CH2CHOSiMe3]n- can be
removed from the hexene/1b copolymer by eluting the polymer/
copolymer mixture through SiO2 with hexanes. The major comono-
mer units are CH3CH(OSiMe3)CH2- (I, 60%) and -CH2CH-
(OSiMe3)CH2- (III, 30%).
The reaction of 1-hexene/1c mixtures with [H(Et2O)2][B(C6F5)4]
under the conditions of Scheme 2 results in cationic polymerization
of 1c with no hexene incorporation. The reaction of 1-hexene/1c
mixtures with AIBN in C6D5Cl at 60 °C for 20 h, in the presence
or absence of Li salts, does not produce copolymer. In contrast,
(R-diimine)PdMe+ copolymerizes 1-hexene/1c under these condi-
tions. These results argue against cationic and radical mechanisms
in Scheme 2.
We propose that the copolymerization in Scheme 2 proceeds by
a normal insertion/chain-walking mechanism.2 As shown in Scheme
3, comonomer units I and II are generated by 1,2 or 2,1 insertion
followed by chain-walking and hexene insertion, and III is
generated by 1,2 or 2,1 insertion followed directly by hexene
insertion. Although only 1,2 insertion was observed in the sto-
ichiometric reactions of 1a-d with (R-diimine)PdMe+, steric
crowding between the migrating polymeryl (P) group and the
Supporting Information Available: Experimental procedures and
characterization data for all compounds and polymers. This material is
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