Simple solvent treatment yields ‘washed-out’ nanoimprints.
Importantly, the gelator has been endowed with reactive
double bonds, the reactivity of the assembled nanostructures
has been demonstrated using OsO4 as reagent and TEM for
imaging. This approach holds out the prospect of using self-
assembly to fabricate functional materials with embedded
reactive nano-scaffolding, an approach which could give rise
to a new generation of advanced functional materials.
Notes and references
1 (a) G. M. Whitesides, Small, 2005, 1, 172–179; (b) I. W. Hamley,
Angew. Chem., Int. Ed., 2003, 42, 1692–1712.
2 (a) Molecular Gels Materials with Self-Assembled Fibrillar Net-
works, ed. R. G. Weiss and P. Terech, Springer, Dordrecht,
Netherlands, 2006; (b) D. K. Smith, Molecular Gels—Nanostruc-
tured Soft Materials in Organic Nanostructures, ed. J. L. Atwood
and J. W. Steed, Wiley-VCH, Weinheim, 2008.
3 (a) Y. Ono, K. Nakashima, M. Sano, Y. Kanekiyo, K. Inoue, J.
Hojo and S. Shinkai, Chem. Commun., 1998, 1477–1478; (b) J. H.
Jung, Y. Ono, K. Hanabusa and S. Shinkai, J. Am. Chem. Soc.,
2000, 122, 5008–5009.
4 (a) E. D. Sone, E. R. Zubarev and S. I. Stupp, Angew. Chem., Int.
Ed., 2002, 41, 1705–1709; (b) E. D. Sone, E. R. Zubarev and S. I.
Stupp, Small, 2005, 1, 694–697.
5 L. Li, E. Beniash, E. R. Zubarev, W. Xiang, B. M. Rabatic,
G. Zhang and S. I. Stupp, Nat. Mater., 2003, 2, 689–694.
6 (a) M. George and R. G. Weiss, Chem. Mater., 2003, 15,
2879–2888; (b) C. Kim, S. J. Lee, I. H. Lee and K. T. Kim, Chem.
Mater., 2003, 15, 3638–3642; (c) M. Shirakawa, N. Fuijita and S.
Shinkai, J. Am. Chem. Soc., 2005, 127, 4164–4165; (d) C. S. Love,
V. Chechik, D. K. Smith, I. Ashworth and C. Brennan, Chem.
Commun., 2005, 5647–5649.
Fig. 6 (A) TEM image of cross section of the poly(styrene–DVB)
wafer created in the presence of gelator 1 (20 mM) after washing with
MeOH–THF. Reactive staining agent: OsO4. Scale bar: 200 nm. (B)
FEGSEM image of cross section of the same wafer—showing fibrillar
nano-imprinting (scale bar = 20 nm).
7 (a) R. J. H. Hafkamp, B. P. A. Kokke, I. M. Danke, H. P. M.
Geurts, A. E. Rowan, M. C. Feiters and R. J. M. Nolte, Chem.
Commun., 1997, 545–546; (b) W. Gu, L. Lu, G. B. Chapman and
R. G. Weiss, Chem. Commun., 1997, 543–545; (c) U. Beginn, S.
high impact polystyrene (HIPS).13 It is noteworthy that only a
small amount of additive causes significant changes in the
materials behaviour. Furthermore, the nanoscale nature of the
additive means that it does not modify the optical properties
of the material (i.e., our polymer wafers with embedded
nanostructures are transparent).
Keinath and M. Moller, Macromol. Chem. Phys., 1998, 199,
¨
¨
2379–2384; (d) U. Beginn, S. Sheiko and M. Moller, Macromol.
Chem. Phys., 2000, 201, 1008–1015; (e) G. Tan, M. Singh, J. He, V.
T. John and G. L. McPherson, Langmuir, 2005, 21, 9322–9326; (f)
E. A. Wilder, K. S. Wilson, J. B. Quinn, D. Skrtic and J. M.
Antonucci, Chem. Mater., 2005, 17, 2946–2952; (g) F.-X. Simon,
Finally, we washed the nanostructured polymer with
MeOH–THF. This mixture was chosen because gelator 1 has
a high solubility in MeOH, whilst THF provides good com-
patibility with the polymer film. Washing removed the
majority of the gelator from the polymer, as shown by the
loss of nitrogen in the elemental analysis data (see ESIw).
Once again, the fact the gelator can be washed from the
polymer wafer proves that the majority of double bonds on
the periphery of gelator 1 had not reacted during the poly-
merisation of styrene–DVB. TEM imaging of the washed
polymer using reactive OsO4 stain supported this proposal,
as fibrillar staining was no longer observed (Fig. 6A). Further-
more, mass spectrometric data (not shown) indicated that the
gelator was washed out in monomeric form. This lack of
double bond reactivity under polymerisation conditions can
be rationalised, as the double bonds on gelator 1 provide much
less stable sites for radical propagation than those in styrene–
DVB. Interestingly, the washed material maintains its
nanoscale ordering which after washing could be imaged by
FEGSEM (Fig. 6B), with the polymer containing ‘washed out’
(imprinted) nano-fibrillar architectures.
N. S. Khelfallah, M. Schmultz, N. Dı
Chem. Soc., 2007, 129, 3788–3789.
az and P. J. Mesini, J. Am.
´ ´
8 (a) E. R. Zubarev, M. U. Pralle, E. D. Sone and S. I. Stupp, Adv.
Mater., 2002, 14, 198–203; (b) J. C. Stendahl, L. M. Li,
E. R. Zubarev, Y.-R. Chen and S. I. Stupp, Adv. Mater., 2002,
14, 1540–1543; (c) J. C. Stendahl, E. R. Zubarev, M. S. Arnold,
M. C. Hersam, H. J. Sue and S. I. Stupp, Adv. Funct. Mater., 2005,
15, 487–493.
9 (a) D. J. Mercurio and R. J. Spontak, J. Phys. Chem. B, 2001, 105,
2091–2098; (b) E. A. Wilder, C. K. Hall, S. A. Khan and R. J.
Spontak, Langmuir, 2003, 19, 6004–6013; (c) S. Wangsoub, R. H.
Olley and G. R. Mitchell, Macromol. Chem. Phys., 2005, 206,
1826–1839; (d) J. Lipp, M. Shuster, A. E. Terry and Y. Cohen,
Langmuir, 2006, 22, 6398–6402.
10 (a) K. S. Partridge, D. K. Smith, G. M. Dykes and P. T. McGrail,
Chem. Commun., 2001, 319–320; (b) B. Huang, A. R. Hirst, D. K.
Smith, V. Castelletto and I. W. Hamley, J. Am. Chem. Soc., 2005,
127, 7130–7139; (c) C. S. Love, I. Ashworth, C. Brennan, V.
Chechik and D. K. Smith, Langmuir, 2007, 23, 5787–5794.
11 M. S. Wendland and S. C. Zimmerman, J. Am. Chem. Soc., 1999,
121, 1389–1390.
12 (a) C. Chaibundit, M. Shao-Min, F. Heatley and C. Booth,
Langmuir, 2000, 16, 9645–9652; (b) A. Kelarakis, Z. Yang, E.
Pousia, S. K. Nixon, C. Booth, I. W. Hamley, V. Castelletto and
J. Fundin, Langmuir, 2001, 17, 8085–8091; (c) A. R. Hirst, D. K.
Smith, M. C. Feiters and H. P. M. Geurts, Langmuir, 2004, 20,
7070–7077.
In summary, this communication reports a gelator incor-
porated into nanostructured polymers, with the resultant
materials having significantly modified materials behaviour.
13 See for example: D. Mathur and E. B. Nauman, J. Appl. Polym.
Sci., 1999, 72, 1151–1164.
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This journal is The Royal Society of Chemistry 2008
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