CL-150405
Received: April 28, 2015 | Accepted: May 25, 2015 | Web Released: June 4, 2015
Photobase Generators Liberating Two Bases by Absorbing One Photon
and Their Application to Photosensitive Materials
Koji Arimitsu,* Yuya Maruyama, and Masahiro Furutani
Department of Pure and Applied Chemistry, Faculty of Science and Technology, Tokyo University of Science,
2641 Yamazaki, Noda, Chiba 278-8510
(E-mail: arimitsu@rs.noda.tus.ac.jp)
We propose a photobase generator (PBG) that liberates two
such as TBD, DBU, and 1,5-diazabicyclo[4.3.0]non-5-ene
(DBN).14,15 However, these PBGs generate only one base
molecule with one photon, where the maximum achievable
quantum yield is Φmax,ach = 1.
bases by absorbing one photon. Phototriggered decarboxylation
proceeds first to generate one base, and subsequently the
unstable reaction intermediate is thermally decarboxylated to
generate another base. It was found that the photosensitivity of
poly(glycidyl methacrylate) films containing the PBG is much
higher than that of films containing a conventional PBG that
generates one base by absorbing one photon.
We have designed PBGs using a new concept, wherein one
PBG could release two base molecules with one photon. In this
case, Φmax,ach = 2, which would be realized by combining a
photochemical process with a thermochemical process in the
photodecomposition reaction (Scheme 1). First, the o-nitro-
benzyloxycarbonyl group of the PBG is photodecomposed to
generate an amine and an unstable β-keto acid salt in a
decarboxylation reaction. Subsequently, the β-keto acid salt is
thermally decomposed by another decarboxylation reaction to
liberate another base molecule at room temperature. Not only
weak aliphatic amines but also strong organic bases could be
chosen to liberate base in the thermochemical process. Whereas
PBG 1a generates two cyclohexylamines, PBG 1b generates one
cyclohexylamine and one TBD.
For the shared acidic part, 3-cyclohexylcarbamoyloxy-3-
(4,5-dimethoxy-2-nitrophenyl)propionic acid was synthesized
in a 24% total yield via three reaction steps from tert-butyl
acetate and 6-nitroveratraldehyde as the starting compounds (see
Supporting Information). Cyclohexylamine or TBD was simply
mixed with the carboxylic acid in THF to precipitate each
product, 1a or 1b, in 70% or 48% yield, respectively. The one-
to-one salt formation was confirmed by 1H NMR and high-
resolution mass spectroscopy (HR-MS) measurements.
Photosensitive materials have been studied extensively
because they are widely used in industrial processes. They are
utilized in the fields of printing, resists, coatings, adhesion,
and electronic materials.1-3 In a UV curing system, radical or
cationic initiators are often used, because such species have
relatively high photosensitivity. However, they also have crucial
problems such as oxygen inhibition and volume shrinkage in a
radical process, or corrosion of metallic substrates in a cationic
process. Now, an anionic UV curing system using photobase
generators (PBGs) is in the limelight because it could circum-
vent these problems. However, in general, basic species from
PBGs are weak bases, and their quantum yields are very low,4-11
which leads to low photosensitivity of the system.
As PBGs generate strong bases, Sun et al. developed a
tetraphenylborate that generates a superbase, 1,5,7-triazabicy-
clo[4.4.0]dec-5-ene (TBD), although its quantum yield is not
high (Φ254 = 0.18).12 Suyama et al. reported the use of a benzo-
formate-type PBG to generate 1,5-diazabicyclo[5.4.0]undec-5-
ene (DBU).13 Our group has focused on photodecarboxylation
reactions of ketoprofen and xanthone acetic acid, which could
be photodecomposed with high quantum yields (Φ313 = 0.75
for ketoprofen and Φ350 = 0.64 for xanthone acetic acid), and
developed their carboxylate-type PBGs generating superbases
Carboxylate-type PBGs 1a and 1b were dissolved in
methanol and in chloroform. The photodecomposition behaviors
during 365 nm light irradiation were examined using their
methanol solutions (Figure 1). The maximum absorption
wavelength, -max, for each PBG was 339 nm. Before UV
irradiation, the molar extinction coefficients, ¾339, were 5.0 ©
photochemical process
O
O
NO2
O
H
O
O
NO
H:B
hν
- CO2
N
H2N
O
+
O
O
O
O
H:B
O
unstable
H2N
N
O
NO
:B =
+
N
N
:B
- CO2
1bH
O
1a
thermalOchemical process
Scheme 1. Mechanism of generation of two base molecules by absorbing one photon from PBGs 1a and 1b.
© 2015 The Chemical Society of Japan