Divergent Heparin Oligosaccharide Synthesis
FULL PAPER
the donor or acceptor contains PMB protective group). The reaction mix-
ture was warmed to À208C while stirring for over 2 h. Then, the mixture
was diluted with CH2Cl2 (20 mL) and filtered over Celite. The Celite was
further washed with CH2Cl2 until no organic compounds were observed
in the filtrate by TLC. All CH2Cl2 fractions were combined and washed
twice with a saturated aqueous solution of NaHCO3 (20 mL) and twice
with water (10 mL). The organic layer was collected and dried over
Na2SO4. After removal of the solvent, the desired oligosaccharide was
purified from the reaction mixture by silica gel flash chromatography.
0.014 mmol, 0.3 equiv per hydroxyl group) and a saturated aqueous solu-
tion of NaHCO3 (125 mL) were added to
a solution of alcohol
(0.045 mmol) in CH2Cl2 (1 mL) and H2O (170 mL) in an ice–water bath.
The resulted mixture was treated with an aqueous NaOCl solution
(150 mL, chlorine content not less than 5%. Fresh NaOCl solution should
be used (as the reaction became sluggish with old NaOCl) and continu-
ously stirred for 1 h as the temperature increased from 08C to room tem-
perature. It was crucial to closely monitor the progress of the reaction,
once the starting material was completely consumed, the reaction should
be quenched with glacial AcOH (150 mL) to pH 6–7. After adjusting the
reaction pH to near neutral, tBuOH (0.7 mL), 2-methyl 2-butene in THF
(2m, 1.4 mL), and a solution of NaClO2 (50 mg, 0.44 mm) and NaH2PO4
(40 mg, 0.34 mm) in H2O (0.2 mL) were added. The reaction mixture was
kept at room temperature for 1–2 h, diluted with saturated aqueous
NaH2PO4 solution (5 mL), and extracted with EtOAc (3ꢃ10 mL). The
organic layers were then combined and dried over MgSO4. After removal
of the solvent, the resulting residue was dissolved in CH2Cl2 (5 mL), fol-
lowed by addition of phenyldiazomethane in diethyl ether until the color
of the reaction remained red. The mixture was stirred at room tempera-
ture for 3 h and then was diluted with CH2Cl2 (50 mL). The organic
phase was washed with saturated NaHCO3 and then dried over Na2SO4.
The solvent was concentrated in vacuo and the compound was purified
by silica gel column chromatography.
General procedure for deprotection of PMB: The PMB-protected com-
pound (1.0 equiv) was dissolved in a mixture of CH2Cl2/H2O (for 0.5 g of
compound, 9 mL/1 mL) and the solution was cooled to 08C. DDQ
(1.5 equiv) was added to the reaction mixture and stirred at room tem-
perature for 4–6 h. The reaction was quenched with saturated NaHCO3
solution and diluted with CH2Cl2 (50 mL) and extracted with water. The
organic phase was washed with H2O until the solution became colorless.
The solvent was concentrated in vacuo and the compound was purified
by silica gel column chromatography.
General procedure for protection of 6-OH with Lev (for substrates with-
À
out the OSO3TCE group): The compound containing 6-OH (1 equiv)
was dissolved in CH2Cl2 (for 0.5 g of compound, 5 mL), followed by addi-
tion of levulinic acid (1.4 equiv), EDC·HCl (1.6 equiv) and DMAP
(1.0 equiv). The mixture was stirred at room temperature overnight and
was then diluted with CH2Cl2 (100 mL) and extracted with water. The or-
ganic phase was washed with saturated NaHCO3 solution, water and then
dried over Na2SO4. The solvent was concentrated in vacuo and the com-
pound was purified by silica gel column chromatography.
General procedure for saponification: The compound (for 100 mg of
compound, 1 equiv) in THF (2.5 mL) was cooled to À58C and LiOH
(1m, 12 equiv per COOBn) was added followed by H2O2 (150 equiv per
COOBn, 30%). The mixture was stirred at room temperature for 16 h
and then MeOH (6 mL) and LiOH (3m, 10 equiv per COOBn) were
added to the solution. The mixture was stirred for another 24 h, which
was acidified with acetic acid to pH 7–7.5 at 08C and concentrated to
dryness on a rotavapor. The resulting residue was purified by a short size
exclusion column (LH-20, 1:1, CH2Cl2/MeOH).
General procedure for protection of 6-OH with Lev (for substrates with
À
a
OSO3TCE group): The compound containing 6-OH (1 equiv) was dis-
solved in CH2Cl2 (for 0.5 g of compound, 5 mL), followed by addition of
levulinic acid (1.4 equiv), EDC (1.6 equiv) and DMAP (0.1 equiv). The
mixture was stirred at À158C to À108C for 6–8 h, then diluted with
CH2Cl2 (100 mL) and extracted with water. The organic phase was
washed with saturated NaHCO3 solution and then dried over Na2SO4.
The solvent was concentrated in vacuo and the compound was purified
by silica gel column chromatography.
General procedure for azide reduction to amine & deprotection of tri-
chloroethoxysulfate ester: To a solution of the azide-containing com-
pound (for 50 mg of compound, 1 equiv) in MeOH (1 mL) was added
ammonium formate solution (1m) in MeOH (2 mL) and Zn power (8–10
equiv). The mixture was stirred at room temperature overnight. The salts
were filtered and washed with MeOH. The mixture was concentrated to
dryness on a rotavapor and the resulting residue was purified through a
size exclusion column (LH-20) (1:1, CH2Cl2/MeOH).
General procedure for the deprotection of TBS (for substrates without a
À
OSO3TCE group): The TBS-protected compound was dissolved in pyri-
dine in a plastic vial (for 100 mg of compound, 1.5 mL). The mixture was
cooled to 08C, followed by addition of HF in pyridine (0.75 mL, 65–70%
in pyridine). The mixture was stirred at room temperature overnight. The
solvents were evaporated under vacuum and then the residue was diluted
in CH2Cl2 (100 mL) and then washed with saturated NaHCO3 solution.
The organic layer was dried over Na2SO4. The solvent was concentrated
in vacuo and the compound was purified by silica gel column chromatog-
raphy.
General procedure for selective N-sulfation: The mixture of NH2-con-
taining compound (for 20 mg of compound, 1 equiv), methanol (1 mL),
pyridine (0.3 mL), Et3N (0.2 mL), 1m Na2CO3 solution (0.15 mL), and
SO3·Py (5 equiv per NH2) was stirred at room temperature. The mixture
was stirred for 12 h and acidified with acetic acid to pH 8.0. In order to
remove salts, the mixture was filtered through a plug of cotton, washed
with methanol and concentrated to dryness on a rotavapor. The residue
was diluted with CH2Cl2/MeOH (1 mL/1 mL) and the resulting solution
was layered on the top of Sephadex LH-20 chromatography column that
was eluted with CH2Cl2/MeOH (1:1, v/v). The appropriate fractions were
evaporated to dryness under vacuo and the residue was used for next
step without further purification.
General procedure for deprotection of TBS (for substrates with
a
À
OSO3TCE group): The TBS-protected compound was dissolved in
CH2Cl2 (for 100 mg of compound, 2.5 mL). The mixture was cooled to
À208C, followed by addition of TMSOTf (4–6 equiv). The mixture was
stirred at À208C for 6–8 h, then the residue was diluted in CH2Cl2
(100 mL) and washed with saturated NaHCO3 solution. The organic
layer was dried over Na2SO4. The solvent was concentrated in vacuo and
the compound was purified by silica gel column chromatography.
General procedure for N-acetylation: The mixture of OH-, NH2-contain-
ing compound (for 12 mg of compound, 1 equiv), Ac2O (10 equiv per
NH2), Et3N (0.15 mL), and pyridine (1 mL) was stirred at room tempera-
ture for overnight. The solvent was evaporated to dryness at room tem-
perature on a rotavapor. The residue was dissolved with CH2Cl2/MeOH
(1 mL/1 mL) and the resulting solution was layered on the top of Sepha-
dex LH-20 chromatography column that was eluted with CH2Cl2/MeOH
(1:1, v/v). The appropriate fractions were evaporated to dryness under
vacuo and the residue was used for next step without further purification.
General procedure for deprotection of Lev: The Lev-protected com-
pound (1 equiv) was dissolved in pyridine (for 150 mg of compound,
2.4 mL) and acetic acid (1.6 mL). The mixture was cooled to 08C, fol-
lowed by addition hydrazine monohydrate (5 equiv for each Lev). The
mixture was stirred at 08C for 6 h and then quenched by acetone
(0.28 mL). The mixture was stirred at room temperature for another 1 h
and the acetone was evaporated under vacuum. The residue was diluted
with EtOAc (50 mL) and extracted with water. The organic phase was
washed with saturated NaHCO3 solution, HCl solution (10%), water,
and then dried over Na2SO4. The solvent was concentrated in vacuo and
the compound was purified by silica gel column chromatography.
General procedure for global debenzylation: The mixture of the Bn-con-
taining compound (for 12 mg of compound, 1 equiv), MeOH/H2O (4 mL/
2 mL), and Pd(OH)2 (50 mg) was stirred under H2 at room temperature
for 24 h, which was filtered through a plug of cotton to remove Pd. The
filtrate was concentrated to dryness under vacuum and then diluted with
H2O (15 mL). The aqueous phase was further washed with CH2Cl2
(5 mLꢃ3), EtOAc (5 mLꢃ3), and then the water was evaporated under
General procedure for 6-OH oxidation to carboxylic acid and benzyl
ester formation: An aqueous solution of NaBr (1m, 25 mL), an aqueous
solution of tetrabutylammonium bromide (1m, 50 mL), TEMPO (2.2 mg,
Chem. Eur. J. 2011, 17, 10106 – 10112
ꢀ 2011 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim
10111