Table 1 Detailed performance of OFETs based on 11a, 11b thin films
Compound
Ts/1C
m/cmÀ2 VÀ1 sÀ1
Ion/Ioff
VT/V
11a
20
60
100
20
60
100
2.73 Â 10À2
7.17 Â 10À2
0.20 (0.23À)a4
1.42 Â 10
2.82 Â 105
8.67 Â 106
5.27 Â 105
1.83 Â 105
1.28 Â 105
2.42 Â 105
À17.5
À23.4
À17.7
À21.3
À42.6
À56.1
11b
1.83 Â 10À3
9.60 Â 10À3
(0.012)a
Fig. 4 AFM images (2 mm  2 mm) of 50 nm thick films of 11a: (a)
deposited on the OTS/SiO2/Si substrate, Ts = 20 1C; (b) deposited on
the OTS/SiO2/Si substrate, Ts = 60 1C; (c) deposited on the OTS/
SiO2/Si substrate, Ts = 100 1C; AFM images (5 mm  5 mm) of 50 nm
thick films of 11b: (d) deposited on the OTS/SiO2/Si substrate, Ts = 20 1C;
(e) deposited on the OTS/SiO2/Si substrate, Ts = 60 1C; (f) deposited
on the OTS/SiO2/Si substrate, Ts = 100 1C.
a
The maximum values of mobility are presented in the brackets
besides the average values.
still rare. Since, the extended p-conjugation contributes to
efficient intermolecular coupling in these solids lacking mole-
cular structural ordering, further modification of the structure
may lead to high performance solution processable materials.
The performance of the OFETs is summarized in Table 1. The
mobilities (m) were calculated in the saturation regime by the
equation: ID = mCi(W/2L)(VG À VT)2, where ID is the drain
current, m is the field-effect mobility, Ci is the gate dielectric
capacitance, W and L are the channel width and length, respec-
tively, VT is the threshold voltage. 11a deposited at 100 1C
(disappearance of sharp Soret bands and appearance of
broadened absorption bands). Also 12b depicted a consider-
ably positive (10.65 ppm) NICS(1) value [Fig. S36, ESIw]. The
UV-vis data of thin films (Fig. S40a and b, ESIw) showed
good correlation with the solution absorption spectra. Cyclic
voltammogram (CV) of 11a (Fig. 3b) in CH2Cl2 shows two
reversible oxidation peaks at E0ox = 642 and 1097 mV vs. SCE
(calibrated using Fc/Fc+ = 0.40 V vs. SCE) indicating the
formation of 20p dicationic species, while 11b showed oxida-
tion peaks at E0ox = 581 and 983 mV vs. SCE (Fig. S41, ESIw).
This data corresponds to HOMO energies of À5.04 eV
(À4.4 À E0ox vs. SCE) for 11a and À4.98 eV for 11b. Compared
with that of 2, the reduced electron donating ability of 11a and
11b is due to the presence of electron withdrawing Cl and F
atoms on the meso-phenyl group.
exhibited the best OFET performance (0.23 cm2 VÀ1 À1) with a
s
much improved on/off ratio of 5 Â 105. The FET characteristics of
11a and 11b are shown in Fig. S44, ESI.w Further, mobility of
these devices did not change significantly, upon exposure to air for
ten days, although the on/off ratio decreased by one order of
magnitude.
In summary, a facile, high yielding synthesis of new meso
substituted tetrathia[22]annulene[2.1.2.1]s has been described.
Compared to the previously reported neutral annulenes these
materials depicted much improved on/off ratios. Their charge
mobility is much superior to analogous a-oligothiophenes. This
difference serves to highlight the role that neutral tetrathiaannul-
enes can play in the development of potentially useful OFETs.
KS and TSV thank DST, New Delhi, for the Research grant
SR/S1/OC-27/2009 and UGC, New Delhi, for the SAP grant
and the Sophisticated Instruments Centre at IIT Indore for
X-ray structure determination.
The band gap of 11a and 11b was estimated to be 1.57 eV
from the absorption onsets. The HOMO levels of 11a and 11b
were estimated to be À5.04 and À4.98 eV, respectively, by CV
measurements which are comparable to the HOMO level of
gold (À4.9 eV) suggesting an effective hole mobility between
the electrode and the semiconductor leading to improved
device performance. Visualization of the HOMOs and LUMOs
of 11a and 11b revealed p-delocalization over the annulene rings of
both 11a and 11b supporting the observed aromatic character and
greater contribution of sulphur atoms to HOMOs compared to
LUMOs (Fig. S38 and S39, ESIw).
Notes and references
Morphologies of the thin (50 nm) film of the heteroannulenes
11a and 11b vacuum deposited on OTS treated SiO2/Si wafers
were studied by atomic force microscopy (AFM) (Fig. 4). The
organic semiconductors (top contact bottom gate) were deposited
on the substrate by thermal evaporation under a pressure of 8 Â
10À4 Pa at a deposition rate gradually increased from 0.1 A sÀ1 to
0.4 A sÀ1 up to the first 20 nm and then maintained 0.5 A sÀ1
until the thickness of the film was 50 nm. When the substrate was
at ambient temperature (20 1C), the film deposited on the
OTS-treated SiO2/Si substrate essentially consisted of small
grains. At elevated temperature (60 1C), the grains became
bigger in size and resulted in more ordered film on the OTS/
SiO2/Si substrate. When the substrate temperature was further
increased to 100 1C, the film cracked and lamellar crystalline
grains were observed. However, no obvious diffraction peaks
could be observed in the XRD patterns, which indicated the
amorphous character of the thin films. In fact, small molecule
based amorphous thin films with a relatively high mobility are
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This journal is The Royal Society of Chemistry 2012