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vertically provided uniform wetting of the substrate in the
well area and favored heterogeneous film growth. The films
prepared by parallel synthesis were shown to have similar
morphology to those synthesized under conventional condi-
tions but their X-ray diffraction patterns indicate lesser
orientation of crystallites. Parallel synthesis was used to
screen the composition space of organic-free clear synthesis
solution for ZSM-5 film growth. The composition SiO2:(0.5 ±
0.7)NaOH:(1/300 ± 1/700)Al2O3:80H2O resulted in continu-
ous ZSM-5 films of Si/Al ꢀ 20:1.
Experimental Section
Two types of silicon sources were used: sodium silicate solution (14%
NaOH and 27% SiO2), and tetraethylorthosilicate (TEOS). Sodium
silicate was filtered by using a Buchner funnel with a coarse fritted disc
immediately before use. When TEOS was used as the silicon source, it was
first dissolved in tetrapropylammonium hydroxide (TPAOH) to form a
clear solution of composition TEOS:0.15TPAOH:0.7NaOH:98H2O,
which was then filtered before use with
a PTFE filter (0.45mm).
Tetrapropylammonium bromide (TPABr) solution (25 wt%) was prepared
and filtered with 0.45 mm cellulose acetate membranes.
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The synthesis mixture was prepared by mixing a measured amount of
chemicals in a transparent LDPE vial of volume 1 mL (Nalgene). When
sodium silicate solution was used, H2SO4 (5n, VWR) was added to adjust
the alkalinity of the final solution. After thorough shaking, a clear synthesis
solution was formed and aged for one day at room temperature without
stirring before being introduced into the well for reaction. Occasionally, the
synthesis mixtures turned turbid immediately after mixing, but the solution
became clear after standing for several hours.
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The substrates employed were nonporous a-alumina disks of diameter
2.5 cm. Prior to seeding the substrates were cleaned by a procedure
described in reference [22]. Seeding of the entire substrate surface with a
monolayer of silicalite particles was carried out using
a previously
Bowl-Shaped Tris(2,6-diphenylbenzyl)tin
Hydride: A Unique Reducing Agent for
Radical and Ionic Chemistry**
developed protocol.[12, 33] The seeds about 0.4 mm in size were finer than
the substrate roughness and did not cause problems in sealing under
pressure against the Teflon surfaces.
Received: August 30, 2000
Revised: November 2, 2000 [Z15732]
Kouji Sasaki, Yuichiro Kondo, and Keiji Maruoka*
Trialkyltin hydrides (R3SnH) are widely utilized in numer-
ous radical reactions including reductive dehalogenations,[1, 2]
desulfurizations,[3] and radical cyclizations.[4] Among several
R3SnH (R Me, Bu, Ph), Bu3SnH is the most popular reagent
in radical chemistry. The Bu3SnH-mediated radical reactions
exhibit high regio- and stereoselectivity by changing radical
initiators (azobisisobutyronitrile (AIBN), benzoyl peroxide
(BPO), hn, Et3B, etc.) and/or the reaction conditions.[5]
Alternatively, such stereoselectivity is also achievable by
replacing Bu3SnH or Ph3SnH[6] with the sterically more
hindered (Me3Si)3SiH.[7] However, it is apparent that there
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[*] Prof. K. Maruoka, K. Sasaki, Y. Kondo
Department of Chemistry, Graduate School of Science
Kyoto University
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Kyoto 606-8502 (Japan)
Fax : ( 81)75-753-4041
and
Department of Chemistry, Graduate School of Science
Hokkaido University
Sapporo, 060-0810 (Japan)
[**] This work was partially supported by a Grant-in-Aid for Scientific
Reserarch from the Ministry of Education, Science, Sports and
Culture.
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Angew. Chem. Int. Ed. 2001, 40, No. 2
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