PHOTOSENSITIZED DECOMPOSITIONS OF OXASILACYCLOPROPANE; UNUSUAL CARBENE FORMATION

DOI: 10.1016/S0040-4039(01)91118-9

Source and publish data:

Tetrahedron Letters p. 5057 - 5060 (1984)

Update date:2022-08-02

Topics:

Authors:

Ando, Wataru

Hamada, Yoshitaka

Sekiguchi, Akira

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Article abstract of DOI:10.1016/S0040-4039(01)91118-9

TCNE photo-sensitized decompositions of oxasilacyclopropane (1) generated carbene and silanone, while the DCA sensitized or direct photolysis of (1) gave silylene and indanone.

Full text of DOI:10.1016/S0040-4039(01)91118-9

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