
Chemistry - A European Journal p. 10014 - 10018 (2015)
Update date:2022-08-04
Topics:
Pialat, Amélie
Bergès, Julien
Sabourin, Axel
Vinck, Robin
Liégault, Beno?t
Taillefer, Marc
The direct, nucleophilic imidation of acetanilide derivatives has been performed under mild, iodine(III)-mediated or -catalyzed conditions, employing lithium triflimide as the nitrogen source. The reaction exhibits exclusive regioselectivity for the para position and shows a good tolerance for varied functional groups at both the ortho or meta positions. Preliminary mechanistic data suggest that the LiNTf2 reagent plays a key role in the reactivity. The direct, nucleophilic imidation of acetanilide derivatives has been performed under mild, iodine(III)-mediated or -catalyzed conditions, employing lithium triflimide as the nitrogen source. The reaction exhibits exclusive regioselectivity for the para position and shows a good tolerance for varied functional groups at both the ortho or meta positions. Preliminary mechanistic data suggest that the LiNTf2 reagent plays a key role in the reactivity.
View MoreHangzhou Gangjin Chemical Co.,Ltd.(expird)
Contact:+86-571-85109780
Address:707 Zhejiang Minhang Bldg., No.290 Zhongshan North Road, Hangzhou 310003, China
Shanghai Demand Chemical Co., ltd,China
Contact:86-021-55237578/55239122
Address:Room 3H, No.578, Yingkou Road, Yangpu District, Shanghai, China
Jiangyin Tenghua Import&Export Co.,Ltd.
Contact:+86-510-86263875
Address:Room 402-B,9 Yanling Road, Jiangyin,Jiangsu, China
Contact:+86-531-58668191 58668193 58668196 58661173
Address:No 55,Beixiaoxinzhuang West Street,Jinan City, Shandong Province
Anhui Sholon New Material Technology Co., Ltd.
website:http://www.sholonchem.com
Contact:+86-550-5261666
Address:4/F Block B, Beijing Chemical Building.No.520 Tianrun Road ,Science & Education Town Wujin District, Changzhou City Jiangsu Province
Doi:10.1007/BF02900578
()Doi:10.1016/j.bmcl.2015.11.007
(2015)Doi:10.1016/0040-4020(75)85085-X
(1975)Doi:10.1016/S0040-4039(97)00559-5
(1997)Doi:10.1007/BF00854110
()Doi:10.1039/b300898c
(2003)