
Journal of Organometallic Chemistry p. 475 - 481 (1997)
Update date:2022-08-25
Topics:
Chatgilialoglu
Ferreri
Vecchi
Lucarini
Pedulli
Polysilanes of the type H(RSiH)nH, where R = n-hexyl or phenyl, have been used as radical-based reducing agents for organic halides. They rival the effectiveness of the other group 14 hydrides in reduction processes. The repetitive hydrogen transfer from the same molecule of H(RSiH)nH allows these compounds to be used in small quantities. Lower (5 × 104 M-1 s-1) and higher (6 × 105 M-1 s-1) limit values for the rate constant of the reaction of primary alkyl radicals with each SiH moiety of H(PhSiH)nH have been obtained by using unimolecular radical reactions as timing devices. The photochemical behavior of these polysilanes in the presence or absence of di-tert-butyl peroxide have been studied by EPR spectroscopy, and the -SiHR-SiR-SiHR radical (R = n-hexyl) has been identified as a transient species. Silyl radicals, obtained from H(RSiH)nH and thermally generated tert-butoxyl radicals, add to a variety of substrates containing double bonds to give the corresponding adducts for which EPR spectra have been recorded.
View More
Shanghai Xinda Pharmaceuticals Co., Ltd.
Contact:86-21-33692333-8008
Address:999 Linxian Road, Jinshan Industrial Park, Shanghai, China
Hefei TNJ chemical industry co.,ltd
website:https://www.tnjchem.com
Contact:+86-551-65418695
Address:B911 Xincheng Business Center, Qianshan Road, Hefei Anhui China
Suzhou BEC Fine Chemicals Co., Ltd.
website:http://www.bek.com.cn
Contact:0512-68095917 18913193865
Address:6, Jin Shan Road, Suzhou New District, 215011 China Suzhou Nations Pharmaceutical Innovation Center Inside
Contact:86-21-31200601
Address:Room1618,FangzhengDaSha,No.1122 Xinjinqiao Road,Pudong New District,Shanghai ,China
Shanghai birch chemical technology co.,ltd
Contact:+86-21-54096810
Address:No.2588,Jungong Road,Shanghai,China
Doi:10.1246/bcsj.54.1950
(1981)Doi:10.1016/j.materresbull.2005.06.004
(2005)Doi:10.1016/j.molcata.2006.05.029
(2006)Doi:10.1021/ja00379a001
(1982)Doi:10.1039/c6ra19606c
(2016)Doi:10.1021/ja0742885
(2007)