Full text of DOI:10.1063/1.104988

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New test structure to identify step coverage mechanisms in chemical vapor
deposition of silicon dioxide
LieYea Cheng, James P. McVittie, and Krishna C. Saraswat
Citation: Applied Physics Letters 58, 2147 (1991); doi: 10.1063/1.104988
View online: http://dx.doi.org/10.1063/1.104988
View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/58/19?ver=pdfcov
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Evaluation Only. Created with Aspose.PDF. Copyright 2002-2021 Aspose Pty Ltd.
This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
128.143.23.241 On: Mon, 22 Dec 2014 20:03:04

Evaluation Only. Created with Aspose.PDF. Copyright 2002-2021 Aspose Pty Ltd.
This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
128.143.23.241 On: Mon, 22 Dec 2014 20:03:04

Evaluation Only. Created with Aspose.PDF. Copyright 2002-2021 Aspose Pty Ltd.
This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
128.143.23.241 On: Mon, 22 Dec 2014 20:03:04