Full text of DOI:10.1063/1.93424

Thermal oxidation of tantalum silicide in O2 and H2O
Krishna C. Saraswat, Ronald S. Nowicki, and John F. Moulder
Citation: Applied Physics Letters 41, 1127 (1982); doi: 10.1063/1.93424
View online: http://dx.doi.org/10.1063/1.93424
View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/41/12?ver=pdfcov
Published by the AIP Publishing
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
129.24.51.181 On: Sun, 30 Nov 2014 07:29:23

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
129.24.51.181 On: Sun, 30 Nov 2014 07:29:23

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
129.24.51.181 On: Sun, 30 Nov 2014 07:29:23