Electron spin resonance spectra of silicon dangling bonds with oxygen back bonds in plasma-deposited amorphous SiOx

Article abstract of DOI:10.1149/1.2044298

Electron spin resonance (ESR) spectra in plasma-deposited amorphous SiO_x films are investigated as a function of oxygen content, x. For x<1.5, a broad resonance line around g = 2.005 dominates the ESR spectra. On the other hand, for x>1.5, seve

Full text of DOI:10.1149/1.2044298

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Downloaded on 2015-04-01 to IP 68.181.221.5 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-04-01 to IP 68.181.221.5 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-04-01 to IP 68.181.221.5 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-04-01 to IP 68.181.221.5 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-04-01 to IP 68.181.221.5 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).