Full text of DOI:10.1063/1.93940

Oxidation of silicide thin films: TiSi2
F. d’Heurle, E. A. Irene, and C. Y. Ting
Citation: Appl. Phys. Lett. 42, 361 (1983); doi: 10.1063/1.93940
View online: http://dx.doi.org/10.1063/1.93940
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Downloaded 12 Aug 2013 to 137.99.26.43. This article is copyrighted as indicated in the abstract. Reuse of AIP content is subject to the terms at: http://apl.aip.org/about/rights_and_permissions

Downloaded 12 Aug 2013 to 137.99.26.43. This article is copyrighted as indicated in the abstract. Reuse of AIP content is subject to the terms at: http://apl.aip.org/about/rights_and_permissions

Downloaded 12 Aug 2013 to 137.99.26.43. This article is copyrighted as indicated in the abstract. Reuse of AIP content is subject to the terms at: http://apl.aip.org/about/rights_and_permissions

Downloaded 12 Aug 2013 to 137.99.26.43. This article is copyrighted as indicated in the abstract. Reuse of AIP content is subject to the terms at: http://apl.aip.org/about/rights_and_permissions