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DOI: 10.1063/1.93940

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Applied Physics Letters p. 361 - 363 (1983)

Update date:2022-08-22

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Authors:

d'Heurle, F.d'Heurle, F.

Irene, E. A.Irene, E. A.

Ting, C. Y.Ting, C. Y.

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Article abstract of DOI:10.1063/1.93940

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Full text of DOI:10.1063/1.93940

Oxidation of silicide thin films: TiSi2  
F. d’Heurle, E. A. Irene, and C. Y. Ting  
Citation: Appl. Phys. Lett. 42, 361 (1983); doi: 10.1063/1.93940  
View online: http://dx.doi.org/10.1063/1.93940  
View Table of Contents: http://apl.aip.org/resource/1/APPLAB/v42/i4  
Published by the AIP Publishing LLC.  
Additional information on Appl. Phys. Lett.  
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Downloaded 12 Aug 2013 to 137.99.26.43. This article is copyrighted as indicated in the abstract. Reuse of AIP content is subject to the terms at: http://apl.aip.org/about/rights_and_permissions  
Downloaded 12 Aug 2013 to 137.99.26.43. This article is copyrighted as indicated in the abstract. Reuse of AIP content is subject to the terms at: http://apl.aip.org/about/rights_and_permissions  
Downloaded 12 Aug 2013 to 137.99.26.43. This article is copyrighted as indicated in the abstract. Reuse of AIP content is subject to the terms at: http://apl.aip.org/about/rights_and_permissions  
Downloaded 12 Aug 2013 to 137.99.26.43. This article is copyrighted as indicated in the abstract. Reuse of AIP content is subject to the terms at: http://apl.aip.org/about/rights_and_permissions  

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Product name:Titanium silicide

Cas No:12039-83-7

12039-83-7

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