7
78
Chemistry Letters Vol.35, No.7 (2006)
Solvolysis of Benzyl Alcohols and Ethers in 1,2-Diols and Application to a Deprotection
of Benzyl Ether-type Protecting Groups
Ã1
1
2
2
Hideyoshi Miyake, Masahiro Fujimura, Takatsugu Tsumura, and Mitsuru Sasaki
1Faculty of Agriculture, Kobe University, Rokkodai, Nada-ku, Kobe 657-8501
Graduate School of Science and Technology, Kobe University, Rokkodai, Nada-ku, Kobe 657-8501
2
(Received April 24, 2006; CL-060491; E-mail: miyakeh@kobe-u.ac.jp)
Some kinds of benzyl alcohols and ethers react with 1,2-di-
p-methoxybenzyl (MPM) ethers 1a and 1b proceeded smoothly
ꢀ
ꢀ
ols, such as ethylene glycol and propylene glycol, at 130–190 C
to give 2-hydroxyethyl or 2-hydroxypropyl ethers. Application
of this reaction to a deprotection of benzyl ether-type protecting
groups, under neutral conditions, was also described.
at 130–150 C to give 2 in good yield. However, in the cases of
less polar substrates such as 1c and 1d, which are not soluble in
hot EG, using PG gave better results. When PG was used instead
of EG, the mixture of 2-(4-methoxyphenylbenzyloxy)-1-propa-
0
nol (4a) and 1-(4-methoxyphenylbenzyloxy)-2-propanol (4a )
was obtained; the ratio of them are not determined.
Not only MPM ethers, diphenylmethyl (DPM) ethers 1h and
1i also react with PG to give 2a and 2b, respectively.
MPM esters 1f and 1g also reacted with EG under similar
conditions to give carboxylic acid.
Recently, we have reported that acetal-type protecting
groups, such as methoxymethyl (MOM) ethers, can be removed
under neutral conditions by heating with 1,2-diols. Those re-
sults suggest that some kinds of C–O bonds may cleave because
of the reaction with ethylene glycol. In this paper, we wish to
report the solvolysis of some benzyl ethers and benzyl alcohols
in 1,2-diols. The former reaction can be used for deprotection
of benzyl ether-type protecting groups under neutral conditions
1
Table 1. Deprotection of benzyl ether- and ester-type protect-
ing groups
Substrates (1)
Ph OMPM
OMPM
Conditions Isolated yield/%
(
Scheme 1).
Benzyl ether-type protecting groups are very popular in or-
ganic syntheses. Not only simple benzyl ethers, substituted ben-
EG
30 °C, 2 h
2a 90
(3a 88)
1
2
1a
zyl ethers are also used to control the easiness for deprotection.
The deprotection of benzyl ether often accomplished with reduc-
tive method using such as H2/Pd–C or Raney Nickel, and ox-
idative method using DDQ is also successful for some benzyl
ethers such as p-methoxybenzyl (MPM) ethers. However,
the deprotection of MPM ether bearing a proximal hydroxyl
group by DDQ is not succesful, and acetal are formed as a main
product.6
O
2b 93
(3a 84)
3
4
EG
50 °C, 4 h
1
MeO
1b
4
,5
OMPM
2c 92
(4a + 4a' 85)
PG
60 °C, 2 h
Ph
1
1c
The new method for the deprotection of benzyl ether-type
protecting groups, described as follows, is quite different from
those methods reported. It is neither a reductive nor an oxidative
method.
When many kinds of benzyl ethers of alcohols and phenols
were heated with ethylene glycol (EG) or propylene glycol (PG),
the solvolysis proceeded smoothly to give alcohols or phenol.
The results are summarized in Table 1. The C–O bond cleavage
proceeded regioselectively, and alcohols (2) and ethers (3 or 4)
were obtained.
COOMe
Ph
Ph
PG
2d 76
160 °C, 2 h
(4a + 4a' 86)
OMPM
1d
PG
2e 97
Ph
OMPM
1
60 °C, 1.5 h (4a + 4a' 82)
1e
COOMPM
2
f 92
EG
40 °C, 4 h
(3a 86)
1
AcO
So far as the substrate is soluble in hot EG, the solvolysis of
1f
COOMPM
EG
2g 96
R2
OH
1
(3a 93)
R −OH +
1
40 °C, 4 h
EG
O
O
2
3
1
g
1
R −O−R2
130−190 °C
PG
150 °C, 7 h
2a 89
(4b + 4b' 88 )
1
Ph
ODPM
ODPM
a
PG
1
2
R −OH +
R
OH
OH
1h
1
R = alkyl, aryl, acyl, H
R = substituted benzyl
2
4
2
O
2b 88
(4b + 4b' 92 )
PG
40 °C, 7 h
R2
a
1
EG = ethylene glycol
PG = propylene glycol
MeO
O
+
1
i
4
'
a4b: 2-(diphenylmethoxy)-1-propanol, 4b :1-(diphenylmethoxy)-
0
Scheme 1.
2-propanol.
Copyright Ó 2006 The Chemical Society of Japan