Journal of Chemical Physics p. 2400 - 2407 (1986)
Update date:2022-08-11
Topics:
Selamoglu, N.
Rossi, M.J.
Golden, D.M.
The reaction between CF3 radicals and silicon oxide (fused silica) surface was studied in a VLPΦ flow reactor (ca. 0.1-3 mTorr) as functions of surface temperature (32-530 K) and CF3 concentration.The CF3 radicals were generated from CF3I by CO2 laser photolysis, and the subsequent gas-phase reaction products were followed by mass spectroscopy.The surface reaction was found to yield CO, HF, CO2, COF2, and SiF4.It was found that H2O residing on the silicon oxide surface was largely responsible for the oxygen- and hydrogen-containing products, and that little etching of the SiOz itself occurred under these conditions.The rates for the irreversible surface loss of CF3, and for the formation of CO were both first order with respect to
Xi'an Costrong Pharmaceutical Co., Ltd.
Contact:029- 68576496
Address:Room 2004,Shuibao Building,No.190,South Erhuan Rd, Yanta District,Xi'an,Shaan Xi,China
Hebei Tianxiang Biological & Pharmaceutical Co., Ltd
Contact:86-0312-6615158
Address:No 42 fazhan street qingyuan county
WUXI HONOR SHINE CHEMICAL CO.,LTD
Contact:+86-510-83593312
Address:No.1699 Huishan avenue,Huishan district,Wuxi ,Jiangsu,China,214177.(Wuxi Huishan Ecomonic Develop Zone )
Hubei Xinghuo Chemical Co., Ltd.,
Contact:13925817279 13907299441
Address:Xinghuo Fine Chemistry Industrial Park, Xiaochang County, Hubei Province, China
Contact:86-512-69362780,69362785
Address:No.69 Weixin Road,Weiting Town,Suzhou Industrial Park
Doi:10.1080/10426509608545208
(1996)Doi:10.1142/S1088424618501146
(2019)Doi:10.1055/s-2004-817783
(2004)Doi:10.1016/j.chempr.2020.04.008
(2020)Doi:10.1039/a802723d
(1998)Doi:10.1002/zaac.202000013
(2020)