pubs.acs.org/joc
more intense in electroluminescence (EL) than in photolumi-
Facile C-H Alkylation in Water: Enabling
Defect-Free Materials for Optoelectronic Devices
3
nescence (PL). Numerous papers attribute this band to the
formation of emissive fluorenone units in the polymer back-
4
bone that intensifies with increasing fluorenone concentra-
Gunin Saikia and Parameswar K. Iyer*
tion. Thus, under all circumstances, the 9-position hydrogens
in fluorene are the sole culprits that undergo oxidation to form
fluorenone units when subjected to high thermal conditions
during device fabrication or photo-degradation when exposed
to light. Hence, finding an appropriate and facile method for
the preparation of “defect free” alkyl-substituted fluorene
monomers not only remains a challenge but would also be a
striking achievement to produce stabilized blue light emitting
devices.
Department of Chemistry, Indian Institute of Technology,
Guwahati 781039, Assam, India
Received January 13, 2010
A common practice associated with C9 alkylation reactions
of fluorene reported so far utilizes high-boiling solvents such as
5-10
DMSO, DMF, HMPA, etc. as the reaction medium.
Yields obtained by these methods were in the range of 63-
0%. DMSO, a solvent used very often, has several draw-
8
backs, most prominently its environmentally adverse impact
and second the tedious reaction workup for the sepa-
ration of DMSO from the final product. Few other alkylation
methods reported in the literature have utilized a combination
of different solvents with metal catalysts, phase-transfer cata-
lysts (PTCs), very strong bases, multiple synthetic steps, and
7-10
extreme reaction conditions,
yet the art of making defect-
free dialkylated fluorene has not been achieved. Employing the
above routes affects the overall economy of the reaction and
needs extraordinary precautions and specialized conditions for
obtaining defect-free dialkylated product. This encouraged us
to investigate a simpler route for the dialkylation of fluorene
that would be economical, environmental friendly, and high
yielding in contrast to the existing methods. The reactivity of
the C-H bond present at the 9-position of “unsubstituted
fluorene” is extremely poor compared to the fluorene molecule
having electron-withdrawing halogen substituents at the 2,7-
positions or only at the 2-position. Hence, activation of the
C-H bond in “unsubstituted fluorene” is predominantly
challenging owing to which this compound has been avoided
or overlooked for alkylation reactions. In this paper, we
demonstrate that alkylation of “unsubstituted fluorene” can
be performed by means of an uncomplicated and facile route,
allowing insertion of a wide variety of alkyl chains on the
A facile method for the alkylation of fluorene achieved
via direct C-H alkylation under aqueous conditions is
reported, wherein the formation of fluorenone is inhib-
ited, resulting in the exclusive formation of the desired
dialkyl-substituted fluorene monomer. As a proof of
concept, this method has also been successfully extended
to perform N-alkylation of carbazole, diphenylamine,
and N,N-dialkylation of aniline in high yields.
Polydialkylfluorenes possess excellent photophysical, ther-
mal, and processing properties, which have made them one of
the most promising materials presently being used to fabricate
blue-light emitting diodes (LEDs) and biosensor applica-
1,2
tions. The presence of a rigidly planar biphenyl unit with a
methylene bridge allows functionalization at the 9-position
resulting in high solubility and processability in the resulting
polymers. However, several studies have demonstrated that
poly(9,9-dialkylfluorene) degrades to give a longer wavelength
emission band in the presence of oxygen over time which is
9-position of fluorene in exceptional yields. Importantly, we
establish that this alkylation route could be extended to
(
5) (a) Murphy, W. S.; Hauser, C. R. J. Org. Chem. 1966, 31, 85–88. (b)
Gonz ꢀa lez, J. J.; Garcıa, N.; G oꢀ mez-Lor, B.; Echavarren, A. M. J. Org. Chem.
997, 62, 1286–1291.
(6) (a) Pie, Q.; Yang, Y. J. Am. Chem. Soc. 1996, 118, 7416–7417. (b)
´
1
(
1) Grell, M.; Knoll, W.; Lupo, D.; Meisel, A.; Miteva, T.; Neher, D.;
Nothofer, H.-G.; Scherf, U.; Yasuda, A. Adv. Mater. 1999, 11, 671–675.
2) (a) Gaylord, B. S.; Heeger, A. J.; Bazan, G. C. J. Am. Chem. Soc. 2003,
Belfield, D. K.; Schafer, K. J.; Mourad, W.; Reinhardt, B. A. J. Org. Chem.
2000, 65, 4475–4481. (c) Fujiwara, S.-I.; Maeda, H.; Matsuya, T.; Shin-I., T.;
Kambe, N.; Sonoda, N. J. Org. Chem. 2000, 65, 5022–5025.
(7) Fedorynski, M.; Wojciechowski, K.; Matacz, Z.; Makosza, M. J. Org.
Chem. 1978, 43, 4682–4684.
(
1
1
25, 896–900. (b) Wang, S.; Gaylord, B. S.; Bazan, G. C. Adv. Mater. 2004,
6, 2127–2132.
(3) (a) Weinfurtner, K.-H.; Fujikawa, H.; Tokito, S.; Taga, Y. Appl. Phys.
Lett. 2000, 76, 2502–2504. (b) Uckert, F.; Tak, Y. H.; M u€ llen, K.; B €a ssler, H.
Adv. Mater. 2000, 12, 905–908.
(8) Xia, C.; Advincula, R. C. Macromolecules 2001, 34, 6922–6928.
(9) Leonetti, F.; Favia, A.; Rao, A.; Aliano, R.; Paluszcak, A.; Hart-
mann, R. W.; Carotti, A. J. Med. Chem. 2004, 47, 6792–6803.
(10) (a) Ranger, M.; Rondeau, D.; Leclerc, M. Macromolecules 1997, 30,
7686–7691. (b) Hagaman, E. W.; Lee, S. K. Energy Fuels 1999, 13, 1006–
1014. (c) Stigers, K. D.; Koutroulis, M. R.; Chung, D. M.; Nowick, J. S. J.
Org. Chem. 2000, 65, 3858–3860. (d) Cho, S. Y.; Grimsdale, A. C.; Jones, D.
J.; Watkins, S. E.; Holmes, A. B. J. Am. Chem. Soc. 2007, 129, 11910–11911.
(
4) (a) Lee, J.-I.; Klaerner, G.; Miller, R. D. Chem. Mater. 1999, 11, 1083–
088. (b) List, E. J. W.; Guentner, R.; Scanducci de Freitas, P.; Scherf, U.
Adv. Mater. 2002, 14, 374–378. (c) Scherf, U.; List, E. J. W. Adv. Mater. 2002,
4, 477–487. (d) Zojer, E.; Pogantsch, A.; Hennebicq, E.; Beljonne, D.;
1
1
Br ꢀe das, J. L.; Scandiucci de Freitas, P.; Scherf, U.; List, E. J. W. J. Chem.
Phys. 2002, 117, 6794–6802.
2
714 J. Org. Chem. 2010, 75, 2714–2717
Published on Web 03/18/2010
DOI: 10.1021/jo100028d
r 2010 American Chemical Society