Inorg. Chem. 2007, 46, 5146−5148
Plasma-Assisted Synthesis and Properties of Na3N†
Grigori V. Vajenine*
Max-Planck-Institut fu¨r Festko¨rperforschung, Stuttgart D-70569, Germany, and Institut fu¨r
Anorganische Chemie, UniVersita¨t Stuttgart, Stuttgart D-70569, Germany
Received March 2, 2007
Dark-blue sodium nitride, Na3N, was prepared by the reaction of
metallic sodium or liquid Na K alloy with plasma-activated nitrogen
at low pressure. The compound crystallizes in the cubic anti-ReO3-
type structure (space group Pm3m with a 4.73301(6) Å and
1) according to powder and single-crystal X-ray diffraction
data. Na3N decomposes above 104 C into the elements, with
Hf estimated at 64(2) kJ/mol.
tion of nitrogen, produced by the electric discharge” with a
specific yellow long-lived afterglow, also known as Lewis-
Rayleigh afterglow. In the following years, the meaning of
the term actiVe nitrogen was extended to include any excited
form of nitrogen, molecular or atomic, of sufficient lifetime
so that its chemical and physical properties can be studied.5
Activation of nitrogen and other gases by means of
electrical discharge received increasing attention in the 1960s
because it was found useful for semiconductor applications,
such as deposition of silicon nitride.6 This technique under-
went significant development under the term plasma actiVa-
tion.7
Though widely used industrially for thin film deposition
of known nitrides, plasma activation of nitrogen was rarely
employed in studies toward new compounds.8 We could
show recently that plasma-enhanced chemical vapor deposi-
tion, for example, can indeed lead to new compounds as in
the case of Ta2N3.9
−
h
)
Z
)
°
∆
+
Alkali metals, with the exception of lithium, react with
elemental nitrogen neither under ambient conditions nor at
higher temperatures. However, as sodium was used to purify
nitrogen for spectroscopic investigations starting in 1872,1
activation by electrical discharge was shown to lead to a
reaction between sodium and nitrogen as reported by Salet
in 1876,2 followed by a number of investigations through
the 1930s3 including studies on the other alkali metals, arc
discharge in liquid nitrogen,3d and thermal decomposition
of the corresponding azides.3f,j Although compound formation
and release of ammonia in subsequent hydrolysis were
described in these studies, no solid analytical and structural
evidence for nitride formation was presented. Only a few
years ago, Na3N4a and K3N4b could be structurally character-
ized in 100-200-nm-thick films obtained by codeposition
of atomized elements at low temperatures.
In this work, we report plasma-assisted synthesis of single-
phase Na3N on a laboratory scale, as well as its chemical
and physical properties.
Na3N was prepared in a reaction of elemental sodium
(typically pieces of ca. 0.5 g) with gaseous nitrogen activated
by capacitive high-frequency discharge (10-50 W and 13.6
MHz) at pressures of 0.1-4 mbar without external heating.
Dark-blue film of the product forms within minutes on the
metal surface at lower power. Use of higher power leads to
heating of the metal, which at some point, presumably near
the melting point of sodium, leads to growth of a micro-
crystalline dark-blue product on a 10 mg scale consisting to
In 1911, Strutt (later Lord Rayleigh) coined the term actiVe
nitrogen3e in order to describe “a chemically active modifica-
† Dedicated to Professor Roald Hoffmann on the occasion of his 70th
birthday.
(1) (a) Schuster, A. Proc. R. Soc. London 1872, 20, 484-487. (b) Schuster,
A. Philos. Mag. 1872, 44, 537-541. (c) Schuster, A. Ann. Phys. 1872,
223, 106-112.
(2) (a) Salet, G. Comp. Rend. 1876, 82, 223-226 and 274-275. (b) Salet,
G. Ann. Phys. 1876, 234, 329-334.
(3) (a) Zehnder, L. Ann. Phys. 1894, 288, 56-66. (b) Mey, K. Ann. Phys.
1903, 316, 127-145. (c) Gehlhoff, G.; Rottgardt, K. Verh. Dtsch. Phys.
Ges. 1910, 12, 492-505. (d) Fischer, F.; Schro¨ter, F. Ber. Dtsch.
Chem. Ges. 1910, 43, 1465-1479. (e) Strutt, R. J. Proc. R. Soc.
London, Ser. A 1911, 85, 219-229. (f) Suhrmann, R.; Clusius, K. Z.
Anorg. Allg. Chem. 1926, 152, 52-58. (g) Okubo, J.; Hamada, H.
Philos. Mag. 1928, 5, 372-380. (h) Okubo, J.; Hamada, H. Philos.
Mag. 1929, 7, 729-736. (i) Moldenhauer, W.; Mo¨ttig, H. Ber. Dtsch.
Chem. Ges. 1929, 62, 1954-1959. (j) Wattenberg, H. Ber. Dtsch.
Chem. Ges. 1930, 63, 1667-1672. (k) Tiede, E. Z. Elektrochem. 1935,
41, 526. (l) Tiede, E.; Knoblauch, H.-G. Ber Dtsch. Chem. Ges. 1935,
68, 1149-1154.
(5) (a) Jennings, K. R.; Linnett, J. W. Quart. ReV. 1958, 12, 116-132.
(b) Mannella, G. G. Chem. ReV. 1963, 63, 1-20. (c) Wright, A. N.;
Winkler, C. A. ActiVe Nitrogen; Academic Press: New York, 1968.
(d) Brown, G. R.; Winkler, C. A. Angew. Chem. 1970, 82, 187-202;
Angew. Chem., Int. Ed. Engl. 1970, 9, 181-196.
(6) (a) Pierson, H. O. Handbook of Chemical Vapor Deposition, 2nd ed.;
Noyes Publications: Berkshire, U.K., 1999. (b) Konuma, M. Plasma
Techniques for Film Deposition; Alpha Science: Oxford, U.K., 2005.
(7) Synonymous descriptions plasma-assisted (PA), plasma-enhanced
(PE), and plasma-induced (PI) are also used interchangeably in the
literature in relation to plasma-activated processes.
(8) (a) Blucher, J.; Bang, K.; Giessen, B. C. Mater. Sci. Eng. 1989, A117,
L1-L3. (b) Prange, R.; Cremer, R.; Neuschu¨tz, D. Surf. Coat. Technol.
2000, 133-134, 208-214. (c) Schiefenho¨vel, N.; Himmel, H.-J.;
Binnewies, M. Angew. Chem. 2003, 115, 6138-6139; Angew. Chem.,
Int. Ed. 2003, 42, 5956-5957. (d) Schiefenho¨vel, N.; Himmel, H.-J.;
Binnewies, M. Z. Anorg. Allg. Chem. 2005, 631, 1507-1511.
(9) Ganin, A. Yu.; Kienle, L.; Vajenine, G. V. Eur. J. Inorg. Chem. 2004,
3233-3239.
(4) (a) Fischer, D.; Jansen, M. Angew. Chem. 2002, 114, 1831-1833;
Angew. Chem., Int. Ed. 2002, 41, 1755-1756. (b) Fischer, D.;
Cancarevic, Z.; Scho¨n, J. C.; Jansen, M. Z. Anorg. Allg. Chem. 2004,
630, 156-160.
5146 Inorganic Chemistry, Vol. 46, No. 13, 2007
10.1021/ic700406q CCC: $37.00
© 2007 American Chemical Society
Published on Web 05/26/2007