Unimolecular Decomposition of SiH4, SiH3F, and SiH2F2 at High Temperatures

DOI: 10.1021/j100156a035

Source and publish data:

Journal of Physical Chemistry p. 1223 - 1227 (1991)

Update date:2022-08-29

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Authors:

Koshi, Mitsuo

Kato, Shin

Matsui, Hiroyuki

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Article abstract of DOI:10.1021/j100156a035

The thermal decomposition of SiH4, SiH3F, and SiH2F2 diluted in Ar was studied behind incident shock waves by monitoring IR emission from these reactant molecules.The rate constants of the unimolecular decomposition for all of three molecules were found t

Full text of DOI:10.1021/j100156a035

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