Journal of the American Chemical Society p. 3764 - 3769 (1980)
Update date:2022-08-23
Topics:
Perkins, G. G. A.
Lampe, F. W.
The photodecomposition of Si2H6 at 147 nm results in the formation of H2, SiH4, Si3H8, Si4H10, Si5H12, and a solid film of amorphous silicon hydride (a-Si:H).Three primary processes are proposed to accoount for the results, namely, (a) Si2H6 + hν -> SiH2 + SiH3 + H (φa=0.61); (b) Si2H6 + hν -> SiH3SiH + 2H (φb=0.18); (c) Si2H6 + hν -> Si2H5 + H (φc=0.21).The overall quantum yields depend on the pressure but at 1 Torr partial pressure of Si2H6 are Φ(-Si2H6)=4.3+/-0.2, Φ(SiH4)=1.2+/-0.4, Φ(Si3H8)=0.91+/-0.08, Φ(Si4H10)=0.62+/-0.03, Φ(Si,wall)=2.2.Quantum yields for H2 formation were not measured.A mechanism is proposed which is shown to be in accord with the experimental facts.
Hangzhou Sartort Biopharma Co., Ltd
website:http://www.sartort.com
Contact:86-571-87039693
Address:No. 57, Tech Park Road, Hangzhou, Zhejiang, China
Contact:+86-021-6989-5597
Address:No.80 Yichuan Rd., Putuo District,Shanghai,P.R.China
website:http://www.cheminn.com/
Contact:86-531-67875205
Address:No.9-2,South of Shanda Road, Jinan ,China
Hangzhou Bayee Chemical Co.,Ltd.
Contact:+86-571-86990109
Address:No.380, Jiangnan Auenue, Binjiang District, Hangzhou, China
Contact:+86-021-50792271
Address:Building 24A, 300 Chuantu Road, Chuansha, Pudong new area, Shanghai, China, 201202
Doi:10.1021/acs.inorgchem.0c02052
(2021)Doi:10.1016/j.tet.2004.05.088
(2004)Doi:10.1016/j.tetlet.2004.09.028
(2004)Doi:10.1007/s10562-014-1455-6
(2015)Doi:10.1016/j.tetlet.2014.09.024
(2014)Doi:10.1039/a606192c
(1997)
