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highly pyrophoric while the alkoxides are solid and have
low volatility. On the contrary, a good compound with a
high volatility and a lower dangerousness is the heterolep-
tic dimethyl-aluminium-isopropoxide. With this precursor,
amorphous Al2O3 depositions occur at moderate tempera-
ture (<400 ◦C) in a atmosphere of oxygen mixed with water
vapour [16]. The obtained films are crack and pore free and
present good surface uniformity.
For the wear protection of the alumina coatings it is also
important to characterize the nano-hardness of the obtained
ties of thin films can be critical for their final performances.
In this regard, several studies concerning the deposition and
the characterization of protective alumina coatings on stain-
investigations concern alumina used as anticorrosion coat-
ing and, to our knowledge, only few data have been reported
about the micro- and nano-hardness of the obtained coatings
of the system Al2O3/stainless steel [21,22].
Therefore, in the present work, we report the results of
an investigation of the compositional, morphological and
nano-mechanical properties of alumina films obtained by
MOCVD on AISI 304 stainless steel, using the volatile
dimethyl-aluminium-isopropoxide as aluminum source. The
films were characterized by X-ray diffraction (XRD), atomic
force microscopy (AFM), Rutherford backscattering spec-
troscopy (RBS) and profilometer scans. The nano-hardness
and elastic properties of both the film and substrate were eval-
uated using the load-depth curve measured by depth sensing
indentation technique and finally, the study of the effects of
different annealing conditions on the surface morphology and
nano-mechanical properties of the coatings have been con-
sidered.
the RUMP software. ERDA measurements were performed
using the HVEC 2.5 MeV AN 2000 accelerator, with a
2.2 MeV He+ beam, in order to investigate Hydrogen con-
tent. AFM characterization of surface morphology was per-
formed with a DME DualscopeTM instrument using silicon
cantilevertipswithnominaltipradiusof10 nminnon-contact
mode. X-ray diffraction measurements were made with a
Philips PW1830 powder diffractometer using Cu K␣ radia-
tion. Film thicknesses were determined using a Tenkor P-10
surface profiler by analysing the film height steps on par-
tially masked samples. The obtained thickness values were
cross-checkedforselectedwiththevaluesobtainedfromRBS
spectra.
Nano-indentation was used to determine film hardness
and elastic modulus using a Nano-test 600 instrument from
Micromaterials Ltd, with a Berkovich (three-sided pyrami-
dal) diamond indenter. The following peak loads were used,
for each sample: 2.5, 5, 7.5, 10, 15, 17.5, 20, 30, 40, 50,
65, 80, 100, 120, 160, 200 mN with loading rate = unloading
rate that were varied in proportion to the peak loads start-
ing at a value of 0.1 mN/s for the 2.5 indentations, while
common experimental conditions as initial (contact) load
0.05 mN and holding period at peak load 10 s were used
for all the measurements. The indentations were repeated
at least five times at each load on different regions of the
sample surface apart 50 m. The hardness and reduced mod-
ulus have been determined from these indentation curves
using a method originally proposed by Oliver and Pharr
which fits a power-law function to the unloading curve [23].
The Young’s modulus of the samples has been calculated
from the reduced modulus via the equation which includes
the effects of non-rigid indenters on the load-displacement
behaviour: 1/Er = (1 − ν2)/E + (1 − νi2)/Ei where E and
ν are the Young’s modulus and Poisson’s ratio for the spec-
imen, respectively; Ei (1141 Gpa) and νi (0.07) the corre-
sponding indenter quantities; and Er is the reduced modulus
which has been obtained by the initial slope of the unloading
curve.
2. Experimental
Alumina coatings were grown in a horizontal hot wall
reactor at a reduced pressure (2 Torr) at a temperature of
380 ◦C using dimethyl-aluminium-isopropoxide. The carrier
gas was nitrogen (10 scc/min) flowing through the bubbler
containing the aluminium source, thermostatically set to
a temperature of 10 ◦C, while the reactant gas (O2 + H2O
vapour mixture, 200 scc/min) was introduced into the main
flow, after the precursor evaporation zone, in close proxim-
ity to the entry of the reaction chamber, in order to avoid
the decomposition of the precursor. The substrate used in the
experiments was AISI 304 stainless steel. The stainless sam-
ples were ground on SiC paper with a final size of 4000 grit
and polished, and all samples were cleaned and degreased
with hot trichloethylene. Annealing of the samples was per-
formed in the same reactor in an N2 and O2 atmosphere.
RBS measurements were performed at the CN accel-
erator at LNL-Legnaro, Italy, using a 2 MeV He2+ beam.
Fixed random spectra were recorded and the film stoichiom-
etry and thickness obtained by simulating the spectra with
3. Results and discussion
Both the as grown and the annealed films were amorphous
as determined by X-ray diffraction. From RBS analysis (see
Fig. 1) only Al and O film signals, floating on a background of
Fe and Cr from the substrate, were detected and a stoichiom-
etry of Al:O ∼ 2:3 was found. No carbon contamination was
detected within the RBS detection limit that we estimate to
be about 2 at.%. Moreover, from ERDA measurements also
the hydrogen content of the films was found to be below
2 at.%. As well together with the absence of C impurities this
indicates that organic residues that may be produced during
the precursor decomposition process, fully desorbs from the
growth surface.