Insertion of Ti into C-H, Si-H, and Sn-H Bonds
Organometallics, Vol. 23, No. 10, 2004 2351
Zn,11,12 Cd,12 and Hg12,13 atoms with CH4 in Ar and CH4
matrixes have also been studied, as have those between
the main-group atoms Mg,14 B,15 Al,16,17 Ga,18 and In18c
and CH4. In all cases, a species of the form HMCH3 with
a terminal M-H bond and a methyl group featuring
terminal C-H bonds is formed, but the reaction pro-
ceeds only after photoactivation of the metal atom. In
previous studies some of us have explored the reactions
of the group 13 element atoms Al and Ga with SiH4;19,20
in both cases, a spontaneously formed complex featuring
a η2-coordinated metal atom was identified and char-
acterized.
Finally, mechanisms leading to oxidative addition
have also been studied in the gas phase by a variety of
different techniques. The insertion of metal ions was
analyzed, for example, by mass spectrometry, and in
some celebrated cases it has proved possible to deter-
mine dissociation energies for certain of the species that
are generated.22 One important result of these studies
is that most transition metals (charged or uncharged)
cannot easily be persuaded to react with methane. In
the case of some metals, e.g. rhodium,23 not only the
possible reaction of the metal atom cation but also the
reactions of the positively charged dimer and of small
clusters were analyzed. An interesting outcome is that
+
Rh2 reacts spontaneously with CH4 to give the dehy-
+
drogenation product [Rh2CH2]+, but Rh+ and Rhn
clusters (n g 2) do not show this behavior.
Herein we report on the reactions occurring between
Ti atoms and CH4, SiH4, and SnH4. In a future publica-
tion we will report our investigations on the reactions
of Ni atoms with SiH4 and SnH4.24 Hence, it will be
shown that the structures of the products of the
spontaneous and photolytically activated reactions be-
tween Ti atoms and SiH4 or SnH4 differ significantly
from those of other MEH4 species that have been
studied to date.
Exp er im en ta l Section
Evaporation of Ti metal was achieved from a resistively
heated Ti filament. The amount of deposited metal was
monitored by using a microbalance and by UV/vis spectroscopy.
UV/vis and Raman spectroscopy were also used to obtain
information about the amount of metal dimers present in the
matrix.25 The matrix was deposited on a freshly polished Cu
block cooled to 12 K by means of a closed-cycle refrigerator
(Leybold LB 510). Other details of the matrix-isolation tech-
nique can be found elsewhere.26
SiH4 was used as purchased from Linde (purity >99.99%).
SiD4, SnH4, and SnD4 were prepared by the reaction of SiCl4
or SnCl4 with LiAlH4 or LiAlD4 in diglyme and purified by
fractional condensation in vacuo. Argon was used as delivered
from Messer (purity 99.998%).
IR spectra were recorded with a Bruker 113v spectrometer.
An MCT detector was used for the spectral region 4000-650
cm-1. Measurements in the region 700-200 cm-1 were carried
out with a DTGS detector. Additional spectra between 700 and
50 cm-1 were recorded using a liquid He cooled bolometer.
UV/vis spectra were recorded with a Xe arc lamp (Oriel),
an Oriel Multispec spectrograph, and a photodiode-array
detector. The resolution varied between 0.2 and 0.5 nm.
A Hg medium-pressure lamp (Philips LP125) in combination
with interference filters was used for photolysis of the ma-
trixes.
The data allowed for an estimate of the differences in
the bond distances d(Si-H) of the slightly distorted SiH4
unit. On photolytic activation, the metal atoms inserted
into the Si-H bond to give HAlSiH3 and HGaSiH3. In
these products, again only terminal H atoms are present.
The reaction of the photoexcited group 12 metals with
SiH4 yields also the insertion products HMSiH3.21
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(26) See, for example: Himmel, H.-J .; Downs, A. J .; Greene, T. M.
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