Journal of Physical Chemistry p. 1024 - 1027 (1981)
Update date:2022-08-11
Topics:
Niki, H.
Maker, P. D.
Savage, C. M.
Breitenbach, L. P.
Further kinetic and spectroscopic characterization was made with the FT IR method for the transistory species (compound X) detected originally by Heath et al. and more recently Su et al. in the gas-phase reaction between O3 and C2H4.The results obtained support the earlier suggestion of Su et al. that compound X is HOCH2OCHO formed by the secondary reaction of the thermally stabilized CH2OO entity with CH2O.
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Doi:10.1039/j39700002674
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