Preparation and characterization of copper(II) oxide thin films grown by a novel spray pyrolysis method

Article abstract of DOI:10.1016/0025-5408(89)90093-7

A novel spray pyrolysis reactor was used to prepare thin films of CuO on silica substrates. The resulting films were characterized by X-ray diffraction, electron microscopy, optical and electrical measurements. The films were single phase, homogeneous, and uniform. The films were p-type semiconductors with room temperature resistivity of 10² ohm-cm. The p-type nature of the films was determined to be due to the presence of Cu(III).