Materials Research Bulletin p. 753 - 760 (1989)
Update date:2022-08-11
Topics:
DeSisto, W.
Sosnowski, M.
Smith, F.
Deluca, J.
Kershaw, R.
et al.
A novel spray pyrolysis reactor was used to prepare thin films of CuO on silica substrates. The resulting films were characterized by X-ray diffraction, electron microscopy, optical and electrical measurements. The films were single phase, homogeneous, and uniform. The films were p-type semiconductors with room temperature resistivity of 102 ohm-cm. The p-type nature of the films was determined to be due to the presence of Cu(III).
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Doi:10.1007/BF01519143
(1911)Doi:10.1021/jacs.7b01983
(2017)Doi:10.1016/S0040-4039(00)77811-7
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(2013)Doi:10.1016/0022-1139(95)03362-9
(1996)Doi:10.1002/adsc.201500701
(2015)
