The Journal of Physical Chemistry A
Article
Sensitivity of Chemically Amplified Resists by Using Chain Reactions
of Acid Generation. Proc. SPIE 2000, 3999, 386−394.
(12) Ongayi, O.; Christianson, M.; Meyer, M.; Coley, S.; Valeri, D.;
Kwok, A.; Wagner, M.; Cameron, J.; Thackeray, J. High Sensitivity
Chemically Amplified EUV Resists Through Enhanced EUV
Absorption. Proc. SPIE 2012, 8322, 83220T.
(13) Willson, C. G.; Roman, B. J. The Future of Lithography:
SEMATECH Litho Forum 2008. ACS Nano 2008, 2, 1323−1328.
(14) Wu, W.; Nuzhdin, K.; Vyushkova, M.; Janik, I.; Bartels, D.
Comparison of Acid Generation in EUV Lithography Films of Poly(4-
hydroxystyrene) (PHS) and Noria Adamantyl Ester (Noria-AD50). J.
Phys. Chem. B 2012, 116, 6215−6224.
(15) Kruger, S.; Revuru, S.; Higgins, C.; Gibbons, S.; Freedman, D.
A.; Yueh, W.; Younkin, T. R.; Brainard, R. L. Fluorinated Acid
Amplifiers for EUV Lithography. J. Am. Chem. Soc. 2009, 131, 9862−
9863.
(16) Wang, M.; Yueh, W.; Gonsalves, K. E. New Anionic Photoacid
Generator bound Polymer Resists for EUV Lithography. Macro-
molecules 2007, 40, 8220−8224.
chemical potential window of 0 to −2.0 V vs Ag/AgCl. Upon
confirming a clean electrolyte solution, the selected PAG was
dissolved in the electrolyte solution (∼10−3 M PAG
concentration) followed by N2 purging for 5−10 min prior to
electrochemical measurements. Three successive cyclic voltam-
mograms were collected for each PAG for determination of
cathodic peak potentials. The scan rate for each potential sweep
was 0.1 V s−1 with a step size of 0.01 V. No iR-compensation
was applied.
AUTHOR INFORMATION
Corresponding Authors
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ORCID
Notes
(17) Satyanarayana, V. S. V.; Kessler, F.; Singh, V.; Scheffer, F. R.;
Weibel, D. E.; Ghosh, S.; Gonsalves, K. E. Radiation − Sensitive Novel
Polymeric Resist Materials: Iterative Synthesis and Their EUV
Fragmentation Studies. ACS Appl. Mater. Interfaces 2014, 6, 4223−
4232.
The authors declare no competing financial interest.
(18) Marshall, J. L.; Stobart, S. R.; Gray, H. B. Spectroscopy and
Photochemistry of Binuclear Iridium(I) Complexes. J. Am. Chem. Soc.
1984, 106, 3027−3029.
ACKNOWLEDGMENTS
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This work was supported in part by the National Science
Foundation Center for Chemical Innovation in Solar Fuels
(Grant CHE-1305124), Center for Chemical Innovation
postdoctoral fellowship to W.S. This work was also funded in
part by The Dow Chemical Company through a university
partnership program (Agreement 227027AH).
(19) Marshall, J. L. Spectroscopy and Photochemistry of Pyrazolyl-
Bridged Binuclear Iridium(I) Complexes. Ph.D. Thesis, California
Institute of Technology, 1986, p 53.
(20) Caspar, J. V.; Meyer, T. J. Photochemistry of Ru(bpy)3
2+
.
Solvent Effects. J. Am. Chem. Soc. 1983, 105, 5583−5590.
(21) Rodman, G. S.; Bard, A. J. Electrogenerated Chemilumines-
cence. 52. Binuclear Iridium(I) Complexes. Inorg. Chem. 1990, 29,
4699−4702.
REFERENCES
■
(1) Cameron, J.; Thackeray, J.; Jain, V.; LaBeaume, P.; Coley, S.;
Ongayi, O.; Wagner, M.; Biafore, J. Progress Towards Production
Worthy EUV Photoresists: Balancing Litho, Outgassing and OOB
Performance. J. Photopolym. Sci. Technol. 2014, 27, 667−675.
(2) Thackeray, J.; Cameron, J.; Jain, V.; LaBeaume, P.; Coley, S.;
Ongayi, O.; Wagner, M.; Rachford, A.; Biafore, J. Progress In
Resolution, Sensitivity, and Critical Dimensional Uniformity of EUV
Chemically Amplified Resists. Proc. SPIE 2013, 8682, 868213.
(3) Cameron, J.; Thackeray, J.; Sung, J. W.; Coley, S. M.; Jain, V.;
Ongayi, O.; Wagner, M. D.; LaBeaume, P.; Kwok, A.; Valeri, D.;
Hellion, M.; Icard, B.; Dal’zotto, B.; Sourd, C.; Pain, L. Comparison of
EUV and e-beam Lithography Technologies For Sub-22-nm Node
Patterning. Proc. SPIE 2012, 8322, 83222F.
(22) Kunze, A.; Muller, U.; Tittes, K.; Fouassier, J.-P.; Morlet-Savary,
̈
F. Triplet Quenching By Onium Salts in Polar and Nonpolar Solvents.
J. Photochem. Photobiol., A 1997, 110, 115−122.
(23) Bushnell, G. W.; Fjeldsted, D. O. K.; Stobart, S. R.; Zaworotko,
M. J.; Knox, S. A. R.; Macpherson, K. A. Pyrazolyl-Bridged Iridium
Dimers. 7. Synthesis and Properties of Bridge-Substituted Analogues
of [Ir(COD)(μ-pz)]2 (pzH = Pyrazole), the “Mixed-Bridge” Complex
[Ir2(COD)2(μ-pz)(μ-fpz)] (fpzH = 3,5-Bis(trifluoromethyl)pyrazole),
and the “Mixed-Metal” Dimer [IrRh(COD)2(μ-pz)2]. Crystal and
Molecular Structures of Bis(cyclooctadiene)bid(μ-3-phenyl-5-methyl-
pyrazolyl)-diiridium(I) (Dissymmetric Isomer) and Bis-
(cyclooctadiene)bis(μ-3,4,5-trimethylpyrazolyl)diiridium(I). Organo-
metallics 1985, 4, 1107−1114.
(4) (a) Dektar, J. L.; Hacker, N. P. Photochemistry of Diary-
liodonium Salts. J. Org. Chem. 1990, 55, 639−647.
(5) Dektar, J. L.; Hacker, N. P. Photochemistry of Triarylsulfonium
Salts. J. Am. Chem. Soc. 1990, 112, 6004−6015.
(6) Hacker, N. P.; Welsh, K. M. Photochemistry of Triphenylsulfo-
nium Salts in Poly[4-[(tert-butoxycarbonyl)oxy]styrene]: Evidence for
a Dual Photoinitiation Process. Macromolecules 1991, 24, 2137−2139.
(7) Welsh, K. M.; Dektar, J. L.; Garcia-Garibaya, M. A.; Hacker, N.
P.; Turro, N. J. Photo-CIDNP and Nanosecond Laser Flash Photolysis
Studies on the Photodecomposition of Triarylsulfonium Salts. J. Org.
Chem. 1992, 57, 4179−4184.
(8) Goldfarb, D. L.; Afzali-Ardakani, A.; Glodde, M. Acid Generation
Efficiency: EUV Photons Versus Photoelectrons. Proc. SPIE 2016,
9779, 97790A.
(9) Kozawa, T.; Tagawa, S. Radiation Chemistry in Chemically
Amplified Resists. Jpn. J. Appl. Phys. 2010, 49, 030001.
(10) Masuda, S.; Kawanishi, Y.; Hirano, S.; Kamimura, S.; Mizutani,
K.; Yasunami, S.; Kawabe, Y. The Material Design To Reduce
Outgassing in Acetal Based Chemically Amplified Resist for EUV
Lithography. Proc. SPIE 2006, 6153, 615342.
(11) Nagahara, S.; Sakurai, Y.; Wakita, M.; Yamamoto, Y.; Tagawa,
S.; Komuro, M.; Yano, E.; Okazaki, S. Methods to Improve Radiation
D
J. Phys. Chem. A XXXX, XXX, XXX−XXX