Aluminium Film Growth by Chemical Vapour Deposition of AlH3(NMe3)2

DOI: 10.1039/c39900000011

Source and publish data:

Journal of the Chemical Society. Chemical communications p. 11 - 12 (1990)

Update date:2022-08-28

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Authors:

Wee, Andrew T. S.

Murrell, Adrian J.

Singh, Nagindar K.

O'Hare, Dermot

Foord, John S.

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Article abstract of DOI:10.1039/c39900000011

The surface thermal decomposition mechanism of bistrimethylamine alane on the Ga rich (4*1) GaAs(100) surface was studied by thermal desorption spectroscopy (TDS), high resolution electron energy loss spectroscopy (HREELS), and XPS and was f

Full text of DOI:10.1039/c39900000011

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