high-pressure ion source by dissociative attachment of elec-
stored in a bubbler at 213 K in the dark and was cooled to
194 K for the experiments.
trons to CF OOCF , as described by Amelynck et al.13,14
3
3
Electrons were produced by a 500 V discharge in an argon
Ñow (purity [99.9999%, 150 STP cm3 min~1). A small Ñow
(2 STP cm3 min~1) of a CF OOCF mixture (2500 ppm in
At BISA, the reactions of CF O~ and CF OH O~ with
3
3
2
ClONO were studied in a 6.5 cm id Ñow tube at room tem-
2
perature and at pressures ranging from 0.4 to 1 Torr. A Ñow
3
3
Ar) was added downstream of the discharge zone. The CF O~
of He (purity [99.9999%) of 4.5 STP L min~1 was used as a
3
ions were introduced into the Ñow tube through a capillary
carrier gas and pumped by a Roots blower. ClONO was
2
tube (6 mm id) located 108.6 cm upstream of the ion analysis
introduced through two electrically insulated Ðxed ring inlets
zone. Above 273 K, only CF O~ and CF OHF~ ions were
located at 43.4 and 77.8 cm from the mass spectrometer inlet.
3
3
observed in the mass spectra, with CF O~ as the major ion.
CF O~ core ions were produced in the same way as at LPCE.
3
The presence of CF OHF~ was attributed to the reaction of
3
3
To study the reaction of CF OH O~ with ClONO at room
3
2
2
CF O~ with trace impurities in the CF OOCF ] Ar
temperature, the CF OH O~ ions were generated by the
3
3
3
3
2
3
mixture. The ratio of CF OHF~ to CF O~ ion count rates in
three-body reaction of CF O~ with residual water in a cooled
3
3
the mass spectra increased with the Ñow tube pressure and
ranged from 0.3 to 10% between 0.8 and 16 Torr. At 225 K,
CF OH O~ and CF O(H O) ~ were formed from the reac-
(195 K) high-pressure section of the Ñow tube upstream of the
reaction zone.13,14 A large fraction of the CF OH O~ ions
3
2
exiting the cooled high pressure zone dissociated into CF O~
3
2
3
2
2
3
and H O in the section of the Ñow tube at room temperature.
2
tion between CF O~ and H O, which is much faster at 225 K
3
2
than at room temperature (see below). The presence of H O
The formation of CF OH O~ at low pressure in this section
2
3
2
was attributed to the presence of impurities in the bu†er gas
was negligible, as veriÐed by using a second CF O~ ion
3
(H O \ 0.5 ppm), to desorption of water from the Ñow tube
source located upstream of the reaction zone. The
2
walls or/and to possible leaks at low temperature (due to con-
[CF OH O~]/[CF O~] ratio at the end of the Ñow tube was
3
2
3
traction of the TeÑon ring used as a seal between the ion
source and the reactor). This enabled a study of the reaction
of CF OH O~ with ClONO at low temperature.
found to be around 5%.
Ions were sampled through an oriÐce of 0.2 mm diameter in
a Ðrst chamber pumped by a 1600 L s~1 turbo-molecular
pump. They were guided by an octopole from the gas expan-
sion zone, behind the inlet oriÐce, to the mass Ðlter located in
a second, separately pumped, chamber. To minimize collision-
induced dissociation of ions in the gas expansion zone, the
di†erence in bias voltage between the inlet plate and the octo-
pole rods was kept at a value of only 0.5 V. After analysis by a
quadrupole mass Ðlter, ions were detected by a SEM.
The determination of the absolute rate constants for the
3
2
2
The neutral reactant ClONO was introduced by a Ðnger
2
inlet located 46 cm upstream of the ion source in order to get
a homogeneous mixture of ClONO and the carrier gas before
2
introduction of the reactant ion. Thus, the distance between
the ion source and the analysis zone (108.6 cm) was taken as
the reaction distance. Electron attachment to ClONO has
2
been previously studied by Van Doren et al.,16 who found
that this process led to the production of NO ~ (D50%),
2
NO ~ (D30%), and ClO~ (D20%) with a rate constant of
3
reactions involving ClONO required the measurement of the
2
(1.1 ^ 0.5) ] 10~7 cm3 molecule~1 s~1. During the study of
ClONO concentration in the Ñow tube. In both apparatuses,
2
the reaction of CF O~ with ClONO , the NO ~ and ClO~
this concentration was measured by UV absorption spectrom-
3
2
2
ions were never observed, showing that the presence of elec-
trons in the Ñow tube was negligible. The ion residence time in
the Ñow tube was typically 18 ms. The latter was measured by
pulsing a biased grid and by synchronously recording the
arrival time of the ion swarm on the SEM detector.17 The
etry in a cell connected to the Ñow tube. The UV absorption
system consisted of a 50 cm long ] 0.7 cm id absorption cell
Ðtted with Suprasil windows and connected to the Ñow tube
by a TeÑon tube. A diluted mixture of ClONO and argon
2
(purity [99.9999%) was Ñowed at 2È15 STP cm3 min~1 with
ClONO concentration range in the Ñow tube was typically
(0.2È2.0) ] 1011 molecule cm~3.
ClONO was synthesized at LPCE, using the method of
an additional Ar Ñow to obtain a constant total Ñow of 100
STP cm3 min~1 through the absorption cell before being
introduced into the main reactor. In order to check the purity
of the chlorine nitrate introduced in the Ñowing afterglow
apparatus, the reaction of SF ~ with ClONO was used.
2
2
Schmeisser18 based on the reaction of Cl O with N O . Cl O
2
2
5
2
and N O were synthesized by the methods of Cady19 and
2
5
6
2
Davidson,20 respectively. During each step of the synthesis,
special care was taken to minimize water traces and hydro-
lysis reactions that would produce HOCl and HNO . Cl O
SF ~ is known to react with ClONO and with all possible
6
2
impurities in ClONO with a comparable rate constant.23,24
2
SF ~ was produced in the same ion source as CF O~, by
3
2
6
3
was obtained by condensing Cl on freshly crystallized and
dried mercuric oxide (HgO) in excess at 77 K. The trap was
electron attachment to SF (purity [ 99.9%) Ñowing at 2È5
2
6
2
STP cm3 min~1. ClONO ~ and mainly FClONO ~ were
2
slowly warmed up to 233 K. After 3 days at this temperature,
Cl O was separated from HgO by distillation. N O was syn-
observed as products of the reaction of SF ~ with ClONO ,
6
2
in agreement with previous studies.23,24 However, FHNO ~
2
2
5
3
thesized by adding a Ñow of NO (purity [99%) to a Ñow of
produced by the reaction of SF ~ with HNO was also
6
3
O
(diluted in O ) at atmospheric pressure. NO and NO ,
observed in the mass spectra. This HNO was assumed to
3
2
2
3
3
resulting from the oxidation of NO by O , reacted to form
result from the ClONO hydrolysis by the trace water
adsorbed on the walls of the tube between the ClONO
bubbler and the reactor. This was conÐrmed by doing experi-
3
2
N O which was collected in a trap cooled at 195 K. ClONO
2
5
2
2
was synthesized by adding Cl O to an excess of N O in a 77
2
2 5
K trap. The trap was slowly warmed up to 233 K and the
ments in which no FHNO ~ was observed when ClONO
3
2
reaction was complete after 3 days. ClONO was puriÐed by
was introduced directly into the Ñow tube without passing
through the UV-absorption cell. The residence time of
2
trap-to-trap distillations to remove traces of N O , Cl O and
2
5
2
Cl . ClONO purity was checked by measuring its vapor
pressure P in the temperature range 186 to 216 K. The plot
ClONO in the UV cell was reduced by minimizing its
2
2
2
volume and by increasing the total Ñow in the cell. By heating
vap
of ln P \ f (1/T ) yielded the values of the vaporization enth-
and passivating the feedlines, the HNO concentration could
vap
vap
3
alpy * H¡ \ 29.4 kJ mol~1, and of the vaporization entropy,
be signiÐcantly decreased, but not totally reduced in the
*
S¡ \ 155.4 J mol~1 K~1 in the above temperature range.
system. Using the rate constants of the reaction of SF ~ with
vap
6
These values are in very good agreement with literature
ClONO and HNO 23 and the ratio of the products of these
2
3
values: * H¡ \ 29.3 kJ mol~1 and * S¡ \ 153.7 J mol~1
reactions, the [HNO ]/[ClONO ] ratio was evaluated to be 2
vap
vap
3
2
K~1 in the temperature range 185È238 K21 and * H¡ \
to 10% in the Ñow tube.
vap
28.8 kJ mol~1 and * S¡ \ 152.7 J mol~1 K~1 in the tem-
perature range 193È299 K.22 This pure ClONO was then
The ClONO absorption was measured at 216 nm, where
vap
2
the absorption cross section p is maximum (p \ 3.45 ] 10~18
2
3684
Phys. Chem. Chem. Phys., 2001, 3, 3683È3689