Fluorineꢀcontaining dialkoxysilanes
Russ.Chem.Bull., Int.Ed., Vol. 58, No. 5, May, 2009
1021
1H nuclei, 50 MHz for 13C nuclei, and 39.7 MHz for 29Si nuclei)
at 25 °С using Me4Si as internal standard. The synthesized
compounds were analyzed on a Tsvetꢀ530 gas chromatograph
using a stainless steel column (0.3×200 cm, 5% SEꢀ30 on the
solid support Chromaton NꢀSuper). The sol fractions of the
polymer films were extracted with diethyl ether and analyzed on
a Knauer Smartline chromatograph with Phenogel Phenomenex
5u columns (300×7.8 mm) and a refractometric detector.
δ: –6.7 (s, SiCH3); 25.6 (s, CH2Si); 70.4 (m, CH(CF3)2); 122.3
1
(q, CF3, JC,F = 283.0 Hz). 29Si NMR ((СD3)2CO), δ: –5.1.
This work was financially supported by the Russian
Foundation for Basic Research (Project Nos 08ꢀ03ꢀ00771
and 08ꢀ03ꢀ90024) and the Council on Grants at the
President of the Russian Federation (Program for State
Support of Leading Scientific Schools of the Russian
Federation, Grant NSh 1396.2008.3).
The mobile phase was THF with a flow rate of 2 mL min–1
.
Calibration was carried out using polystyrene standards with
molecular weights in the range from 3 420 to 2 570 000.
Elemental analyses were carried out at the Analytical Center
of the Institute of Organometallic Chemistry of the Russian
Academy of Sciences.
References
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Ether, methanol, and THF were purified using known
methods.22 Fluorinated alcohols (purchased from ZAO P&Mꢀ
Invest) were used without additional purification.
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Methyl(3,3,3ꢀtrifluoropropyl)dimethoxysilane (1). Methylꢀ
(3,3,3ꢀtrifluoropropyl)dichlorosilane (20.00 g, 0.095 mol) was
added dropwise for 3 h in an argon flow to methanol (6.68 g,
0.208 mol). The reaction mixture was heated for 6 h at 40—50 °С,
blowing out hydrogen chloride with argon. The mixture was
distilled under reduced pressure. Compound 1 was obtained in a
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20
yield of 10.40 g (54%), m.p. 27 °С (26 Torr), nD = 1.3610
(Ref. 25: nD = 1.3576). IR, ν/cm–1: 2950, 2846, 1450, 1372
20
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(in Russian).
(С—Н), 1313, 1267, 1208 (C—F), 1085 (Si—O—C), 1026, 902,
1
850, 817 (ОСН3). Н NMR (CDCl3), δ: 0.15 (s, 3 Н, SiCH3);
0.82 (m, 2 Н, CH2Si); 2.11 (m, 2 Н, CH2CF3); 3.52 (s, 6 Н,
ОСН3). 29Si NMR ((СD3)2CO), δ: –4.5.
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Methyl(3,3,3ꢀtrifluoropropyl)bis(2,2,2ꢀtrifluoroethoxy)silane
(2). Compound 2 was synthesized similarly to compound 1
from 2,2,2ꢀtrifluoroethanol (12.73 g, 0.127 mol) and methylꢀ
(3,3,3ꢀtrifluoropropyl)dichlorosilane (12.09 g, 0.057 mol).
Compound 2 was obtained after distillation under reduced
pressure in a yield of 12.60 g (65%), m.p. 60 °С (22 Torr),
20
nD = 1.3302. Found (%): С, 27.99; Н, 3.89. С8Н11О2SiF9.
Calculated (%): С, 28.40; Н, 3.30. IR, ν/cm–1: 2958, 2806,
1449, 1373 (С—Н), 1269, 1169 (C—F), 1072 (Si—O—C), 905,
856 (OCH2CF3). 1Н NMR (CDCl3), δ: 0.30 (s, 3 Н, SiCH3);
0.93 (m, 2 Н, CH2Si); 2.12 (m, 2 Н, CH2CF3); 4.05 (q, 4Н,
ОСН2CF3). 13С NMR ((СD3)2CO), δ: –4.6 (s, SiCH3); 7.4
2
(s, CH2Si); 28.5 (q, CH2CH2CF3, JC,F = 30.5 Hz); 62.8 (q,
OCH2CF3, 2JC,F = 36.1 Hz); 126.4 (q, OCH2CF3, 1JC,F = 277.5 Hz);
129.8 (q, CH2CH2CF3, 1JC,F = 275.5 Hz). 29Si NMR ((СD3)2CO),
δ: –0.04.
Methyl(2,2,2ꢀtrifluoroꢀ1ꢀtrifluoromethylethoxymethyl)bisꢀ
(2,2,2ꢀtrifluoroꢀ1ꢀtrifluoromethylethoxy)silane (3). Chloromethylꢀ
methyldichlorosilane (3.36 g, 0.021 mol) was added dropwise
with stirring in an argon flow to sodium hexafluoroisopropylate
obtained from hexafluoroisopropyl alcohol (10.36 g, 0.062 mol)
and sodium hydride (1.48 g, 0.062 mol) in THF. The reaction
mixture was heated for 0.5 h at 50—60 °С. The precipitate was
separated on the Schott filter and washed with hexane. The
residue was distilled under reduced pressure. Compound 3
17. R. J. P. Corriu, G. Royo, A. Saxce, J. Chem. Soc., Chem.
Commun., 1980, 19, 892.
was isolated in a yield of 5.10 g (45%), b.p. 58 °С (20 Torr),
20
nD = 1.3232. Found (%): С, 23.60; Н, 2.14. С11Н8О3SiF18
.
Calculated (%): С, 23.25; Н, 1.60, IR, ν/cm–1 : 2948, 2889,
1376 (С—Н), 1293, 1230, 1220 (C—F), 1200 (C—F; C—O—C),
1105, 1050 (Si—O—C), 894 (OCH(CF3)2). 1Н NMR (CDCl3),
δ: 0.55 (s, 3Н, CH3); 2.94 (s, 2 H, CH2Si); 3.96 (m, 1 Н,
CH(CF3)2); 4.64 (m, 2 H, OCH(CF3)2). 13С NMR ((СD3)2CO),
18. R. J. P. Corriu, W. Douglas, SiliconꢀBased Polymers: The
Science and Technology of Their Synthesis and Applications,
Eds R. G. Jones, W. Ando, J. Chojnowski, Kluwer, Dodrecht,
Section 3, Polysilanes and Related Polymers, Ed. R. G. Jones,
2000, 25, 667.