Full text of DOI:10.1063/1.106070

50 nm linewidth platinum sidewall lithography by effusivesource metal precursor
chemical deposition and ionassisted etching
David S. Y. Hsu
Citation: Applied Physics Letters 59, 2192 (1991); doi: 10.1063/1.106070
View online: http://dx.doi.org/10.1063/1.106070
View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/59/17?ver=pdfcov
Published by the AIP Publishing
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
132.236.27.111 On: Wed, 17 Dec 2014 23:01:10

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
132.236.27.111 On: Wed, 17 Dec 2014 23:01:10

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
132.236.27.111 On: Wed, 17 Dec 2014 23:01:10