CATHODIC DEPOSITION OF AMORPHOUS SILICON FROM TETRAETHYLORTHOSILICATE IN ORGANIC SOLVENTS.

Article abstract of DOI:10.1149/1.2127597

A blue thin film of amorphous silicon has been deposited on a nickel cathode by the electrolysis of a solution of tetraethylorthosilicate in acetic acid. The maximum thickness of the film obtained was about 0. 5 mu m. The deposit was confirmed to be amorphous silicon by IR reflection spectra, RHEED, and nondispersive x-ray analysis in the scanning electron microscope. This work is pertinent to solar cells.

Full text of DOI:10.1149/1.2127597

Downloaded on 2014-05-25 to IP 130.217.227.3 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2014-05-25 to IP 130.217.227.3 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2014-05-25 to IP 130.217.227.3 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2014-05-25 to IP 130.217.227.3 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).