D742
Journal of The Electrochemical Society, 155 ͑12͒ D742-D749 ͑2008͒
0013-4651/2008/155͑12͒/D742/8/$23.00 © The Electrochemical Society
Electrodeposition of Co–P Films from Alkaline Electrolytes
X. Xua,b, and G. Zangari
*
a,c,**,z
aCenter for Electrochemical Science and Engineering, bDepartment of Chemical Engineering, and cDepartment
of Materials Science and Engineering, University of Virginia, Charlottesville, Virginia 22904, USA
We study the influence of solution chemistry on the electrodeposition of Co–P from a citrate–glycinate alkaline electrolyte. The
concentration of different cobalt complexes is calculated from chemical equilibria as a function of solution pH to examine the
strength of the complexing agents, and compared with cyclic voltammetry ͑CV͒ data. CV and electrochemical quartz crystal
microbalance are utilized to elucidate the effect of different P sources ͑NaH2PO2 or H3PO3͒ on the electrodeposition process. The
influence of plating conditions as well as different P sources on the deposit composition, microstructure, and magnetic properties
are investigated. Both citrate and glycine are good complexing agents for cobalt, the former having a stronger effect. The addition
of NaH2PO2 depolarizes cobalt reduction, while P codeposition from solutions containing H3PO3 is negligible. Pure cobalt and
Co–P films grown from the H3PO3 source display a hexagonal close-packed ͑hcp͒ crystal structure and soft magnetic properties.
The Co–P films grown from solutions containing NaH2PO2 display an amorphous structure with a P content above ϳ10 atom %
in the deposit. Only when the plating current is small ͑Ͻ5 mA/cm2͒ and the P content is low the films are crystalline with an hcp
structure. These latter films display in-plane magnetic anisotropy and a relatively high coercivity.
© 2008 The Electrochemical Society. ͓DOI: 10.1149/1.2988132͔ All rights reserved.
Manuscript submitted July 17, 2008; revised manuscript received August 25, 2008. Published October 7, 2008.
Co–P alloy films have been extensively investigated due to their
composition, and crystal structure of the films were investigated by
scanning electron microscopy ͑SEM͒, energy-dispersive X-ray spec-
troscopy ͑EDS͒, and X-ray diffraction ͑XRD͒ techniques, respec-
tively.
interesting magnetic, electrical, and diffusion barrier properties. For
example, they have been studied as hard magnetic materials for
longitudinal recording,1-3 as soft magnetic materials,4 and as diffu-
sion barrier layers in microelectronic devices.5
Co–P alloys have mostly been grown by electroless deposition
from acidic or alkaline solutions.3,5-7 In these instances, NaH2PO2 is
used as the reducing agent as well as the phosphorus ͑P͒ source. On
a catalytic surface, such as Co or Ni, H2PO−2 is oxidized to H2PO−3
and releases electrons, which in turn reduce metal ions to form a
metallic film. This reduction process is accompanied by hydrogen
evolution and, in parallel, by phosphorus reduction and incorpora-
tion in the film. Amorphous films are obtained when P content is
Ͼϳ10 atom %.
Co–P alloys can also be electrodeposited from acidic electro-
lytes; in this case, H3PO3 is used as a P source.8,9 Phosphorus can be
codeposited only in parallel with the reduction of a transition metal
͑Fe, Co, Ni͒; this is an example of induced deposition according to
Brenner. The detailed mechanism of this process is not yet under-
stood. The P content as well as the microstructure of the deposits
can be controlled by varying the pH value, concentration of H3PO3,
temperature, as well as plating current density.9 The codeposition of
P results in a decrease of the grain size of the film, film amorphiza-
tion ͑above 13 atom % P9͒, and changes in preferred orientation. For
example, Fukunaka reported a change in preferred orientation of the
hexagonal close-packed ͑hcp͒ structure from ͑10.0͒ to ͑00.2͒ with
increasing P content.9
Few reports are available on the electrodeposition of Co–P or
Co–Ni–P films from neutral or alkaline electrolytes, where
NaH2PO2 is chosen as the P source10-14 and complexing agents are
added to stabilize metal ions in the solution. We are not aware of any
studies on the role of different complexing agents, nor on the effect
of NaH2PO2 on the deposition process.
Electrolyte Solution Chemistry
Electrolytes and complexing agents.— Table I shows the com-
position of the electrolytes used for Co and Co–P electrodeposition.
Three solutions were used. Solution A, for Co electrodeposition,
contains 0.1 M Co͑SO3NH2͒2, 0.1 M ͑NH4͒2C6H6O7, and 0.1 M
NH2CH2COOH. Solutions B and C contain, in addition to the re-
agents in A, 0.1 M H3PO3, or 0.1 M NaH2PO2, respectively.
The pH of the solution was kept at 8 by the addition of NaOH,
unless pH effects were studied. The electrolyte is derived from an
electroless Co–P plating bath described in Ref. 15, with the pH
decreased from 10 to 8 to avoid electroless deposition. Ammonium
citrate ͓͑NH4͒2C6H6O7͔ is a derivative of citric acid, an organic
compound containing three carboxylic groups, capable of binding
transition metal ions, thus preventing their precipitation as hydrox-
ides in alkaline environments. Co in fact would precipitate as
Co͑OH͒ ͑solubility constant Ksp = 5.92 ϫ 10−15͒ in alkaline con-
2
ditions. The ammonium ion produced by dissociation of the citrate
salt may also contribute to Co2+ complexation. Finally, glycine
H2N–CH2COOH is an amino acid that complexes transition metals,
though less efficiently than citrate.
Chemical equilibria as a function of solution pH.— Relevant equi-
libria in the Co and Co–P electrolyte, and the corresponding equi-
librium constants ͑obtained from Ref. 16͒ are reported in Table II.
Co2+ tends to associate with citrate and ammonia according to the
equilibria Eqs. 1, 2, and 6. Such equilibria also depend on the dis-
sociation of citrate and ammonia ͑Eqs. 3–5, 7͒, which are a function
of solution pH. Co2+ associates with glycine as well ͑Eqs. 8–10͒, the
ionic form of which depends on solution pH ͑Eqs. 11, 12͒. Equilib-
ria related to the P-containing species have been neglected. The
equilibria listed in Table I were solved simultaneously and the con-
centration of the various Co species was calculated as a function of
pH. The results are shown in Fig. 1.
In this paper, the electrodeposition of Co–P alloys from alkaline
baths containing diammonium citrate and glycine as complexing
agents for cobalt ions was studied. The complexation strength of
each chemical compound was examined by cyclic voltammetry
͑CV͒ and the concentration of different complexes was calculated
according to the possible association equilibria. Two P sources, so-
dium hypophosphite ͑NaH2PO2͒ and phosphorous acid ͑H3PO3͒,
were used to study the influence of processing parameters, such as
pH and plating current, on the deposition process. Film morphology,
It is found that the main cobalt species present in solution is
CoC6H5O−, independent of pH. With increasing pH, the association
between c7obalt and glycine is enhanced and saturates around pH 9;
the concentration of free Co2+ continuously decreases and becomes
constant at about 2 ϫ 10−5 M above pH 9. The association between
NH3 and Co2+ strengthens drastically with increasing pH, yet the
2+
6
concentration of Co͑NH3͒ remains more than one order of mag-
*
Electrochemical Society Student Member.
Electrochemical Society Active Member.
nitude smaller than that of other complexes. Above pH 9 ͓Co2+͔ is
**
z E-mail: gz3e@virginia.edu
higher than its solubility limit and Co͑OH͒ will tend to precipitate.
2
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