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alloys with a very wide range of alloy compositions and prop-
erties by simply varying the applied pulse parameters. A re-
view of the theory and practice of pulse plating is available
[20]. In the electroprocess using pulsed current (PC), three
parameters, the peak current density, the on-time and the off-
time, at least, can be varied independently. If a pulse with
reverse current is used, even more parameters could be used
to modulate the composition and morphology of Zn–Co al-
loy deposits. Furthermore, it is possible for zinc component
in Zn–Co alloys to be removed preferentially when convert-
ing current from cathodic to anodic, which may result in the
deposition of high-cobalt-containing Zn–Co alloys. In the
present work, the PC electrodeposition of Zn–Co alloy from
a sulphate bath has been studied. The bath was free of ad-
ditives such as levelers or brighteners. The range of average
current density (Iav) of pulse plating was chosen in the same
range as the current density normally used to produce the DC
deposits. The composition and morphology of the deposited
alloys were analysed as a function of the PC parameters.
Fig. 1. A typical pulse waveform for the electrodeposition of Zn–Co alloy
deposits.
Zn–Co deposit is nT (the value of n depending on the de-
posit thickness). The frequency (f) used for pulse plating was
in the range of 1–500 Hz. It should be noted that the pulse
waveform will be distorted by the charging or discharging of
the electrical double layer at the electrode–solution interface
if the frequency used is much higher than 500 Hz, the pulsed
current is virtually ‘a direct current’, and the potential benefit
of pulse plating is lost. The range of average current densities
(Iav) investigated in this work varied from 5 to 320 mA/cm2,
2. Experimental
Thesubstrateforelectroplatingwasmildsteelpanels(with
a plated area of 4 cm × 4 cm). Pretreatment before plating
consisted of an initial soak in an alkaline cleaner (40 g l−1
sodium carbonate + 5 g l−1 sodium hydroxide) at 60 ◦C for
5 min followed by rinsing in tap water, then degreasing by us-
ingcathodic cleaning ina solution containing 25 g l−1 sodium
carbonate, 25 g l−1 sodium hydroxide and 50 g l−1 tri-sodium
phosphate at ambient temperature. After rinsing in tap wa-
ter, etching in (50% v/v) S.G. 1.18 HCl, followed by further
rinsing in tap water, the panels were electroplated in accor-
dance with the pre-determined conditions. The trials on the
effects of pulse plating parameters on the cobalt content in
the Zn–Co alloy deposits were carried out by varying one
parameter and keeping the others constant. Electrodeposited
Zn–Co alloy coatings were characterised by their surface ap-
pearance, composition and surface morphologies. The sur-
face morphologies were evaluated using scanning electron
microscopy (SEM), and an attendant energy dispersive X-
ray analyser (EDA) was used to analyse the composition of
Zn–Co alloy deposits.
and the value for reverse anodic peak current densities (Ip−
)
was chosen to be a fraction of the positive peak current den-
sity (Ip+), namely Ip− = xIp+ (x = 0, 0.2, 0.4, 0.6 or 0.8). For a
given average current density (Iav) and the value of fraction
Although some literatures are available on the electrode-
position of Zn–Co alloys, very little attention has been given
to the pulse plating of this alloy [21]. In the present work
a computer-aided pulse plater unit (CAPP, Axel Akermenn
A/S) was used for the electrodeposition of Zn–Co alloy de-
posits. The basic waveform used for the investigation of
the effects of pulse parameters is shown in Fig. 1. Symbols
marked in the schematic diagram, Ip+, Ip−, Iav, T, tc, and ta,
stand for positive peak current density (Ip+), reverse peak cur-
rent density (Ip−), average current density (Iav), cycle time
(T), cathodic time (tc) and anodic time (ta), respectively. The
cathodic time (tc) and anodic time (ta) were kept the same
in all cases during pulse plating. The plating time for every
Fig. 2. Effect of cobalt ion content in the bath on cobalt content in Zn–Co
alloy deposits.