Full text of DOI:10.1063/1.99046

Timeofflight study on the thermal etching of Al with Cl2
R. J. A. A. Janssen, A. W. Kolfschoten, and G. N. A. van Veen
Citation: Applied Physics Letters 52, 98 (1988); doi: 10.1063/1.99046
View online: http://dx.doi.org/10.1063/1.99046
View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/52/2?ver=pdfcov
Published by the AIP Publishing
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
129.49.251.30 On: Fri, 05 Dec 2014 04:33:08

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
129.49.251.30 On: Fri, 05 Dec 2014 04:33:08

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
129.49.251.30 On: Fri, 05 Dec 2014 04:33:08