trisilane

Base Information

• Chemical Name: trisilane
• CAS No.: 134303-33-6
• Molecular Formula: H₈Si₃
• Molecular Weight: 92.32
• Mol file: 134303-33-6.mol

Synonyms:TRISILANE RADICAL ION

Chemical Property of trisilane

Chemical Property:

• PSA: 0.00000
• LogP: -3.28400

Purity/Quality:

99% ^*data from raw suppliers

Safty Information:

• Pictogram(s):  
• Hazard Codes: 

MSDS Files:

SDS file from LookChem

Useful:

Technology Process of trisilane

There total 30 articles about trisilane which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:

Reference yield: 55.0%

potassium (7440-09-7) + monosilane (7440-21-3) + Nonafluorobutansulfonsaeure-silylester (135524-36-6) → trisilane (7783-26-8,134303-33-6) + disilane (1590-87-0) + isotetrasilane (13597-87-0) + neopentasilane (15947-57-6)

Guidance literature:

In diethylene glycol dimethyl ether; byproducts: H2; further intermediate: KSiH3; under N2, dispersion of potassium reacts with SiH4 at 100°C, concd. in vacuo at 30°C, C4F9SO3SiH3 added at -60°C, stored at this temp. for 10 min, warmed to 40°C; volatiles removed over 3 h in vacuo, SiH4 removed; GC;

Reference yield: 55.0%

sodium (7440-23-5) + monosilane (7440-21-3) + Nonafluorobutansulfonsaeure-silylester (135524-36-6) → trisilane (7783-26-8,134303-33-6) + disilane (1590-87-0) + isotetrasilane (13597-87-0) + neopentasilane (15947-57-6)

Guidance literature:

In diethylene glycol dimethyl ether; byproducts: H2; further intermediate: NaSiH3; under N2, dispersion of sodium reacts with SiH4 at 100°C, concd. in vacuo at 30°C, C4F9SO3SiH3 added at -60°C, stored at this temp. for 10 min, warmed to 40°C; volatiles removed over 3 h in vacuo, SiH4 removed; GC;

Reference yield: 50.0%

potassium (7440-09-7) + monosilane (7440-21-3) + benzenesulfonic acid (98-11-3) → trisilane (7783-26-8,134303-33-6) + disilane (1590-87-0) + isotetrasilane (13597-87-0)

Guidance literature:

In diethylene glycol dimethyl ether; byproducts: H2; further intermediate: KSiH3; under N2, dispersion of potassium reacts with SiH4 at 100°C, soln. of PhSO3H added dropwise at -40°C; volatiles removed at room temp. in vacuo, SiH4 removed; GC;

upstream raw materials:

hydrogen fluoride

monosilane

hydrogen sulfide

hydrogen

Refernces

• 1、 Jasinski, Joseph M.,Chu, Jack O.. "Absolute rate constants for the reaction of silylene with hydrogen, silane, and disilane". . p. 1678 - 1687. Retrieved 1988.
• 2、 Sogoshi, Norihito,Sato, Shoji,Takashima, Hideaki,Sato, Tetsuya,Hiraoka, Kenzo. "Synthesis of polysilanes by tunneling reactions of H atoms with solid Si2H6 at 10K". . p. 986 - 987. Retrieved 2009.
• 3、 B?hme, Uwe,Franze, Georg,Friebel, Mike,Gerwig, Maik,Gründler, Franziska,Kroke, Edwin,Rosenkranz, Marco,Schmidt, Horst. "Syntheses and Molecular Structures of Liquid Pyrophoric Hydridosilanes". . p. 762 - 773. Retrieved 2020/08/05.
• 4、 -. "Silane-phenol compound, overcoat formulation, and electrophotographic imaging member". . . Retrieved 2008/06/13.