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1184-76-5

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1184-76-5 Usage

Uses

Diiododifluoromethane is useful for the synthetic preparation of alpha,omega-diiodoperfluoroalkanes.

Check Digit Verification of cas no

The CAS Registry Mumber 1184-76-5 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 1,1,8 and 4 respectively; the second part has 2 digits, 7 and 6 respectively.
Calculate Digit Verification of CAS Registry Number 1184-76:
(6*1)+(5*1)+(4*8)+(3*4)+(2*7)+(1*6)=75
75 % 10 = 5
So 1184-76-5 is a valid CAS Registry Number.
InChI:InChI=1/CF2I2/c2-1(3,4)5

1184-76-5SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 16, 2017

Revision Date: Aug 16, 2017

1.Identification

1.1 GHS Product identifier

Product name Diiododifluoromethane

1.2 Other means of identification

Product number -
Other names Difluorodiiodomethane

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:1184-76-5 SDS

1184-76-5Relevant articles and documents

A simple method for preparing difluorodiiodomethane from difluoro(fluorosulfonyl)acetyl fluoride

Xiao, Ji-Chang,Duan, Jian-Xin,Li, An-Rong,Guo, Yong,Chen, Qing-Yun

, p. 1320 - 1324 (2002)

Difluorodiiodomethane is prepared in 60% yield by the reaction of difluoro(fluorosulfonyl)acetyl fluoride with I2/KI in the presence of a catalytic amount of SiO2 in acetonitrile at 60-65°C.

Mc Alpine,Sutcliffe

, p. 1422 (1970)

A simple, novel method for the preparation of trifluoromethyl iodide and diiododifluoromethane

Su,Duan,Chen

, p. 807 - 808 (1992)

-

Fluorine-containing compound, and its manufacturing method (by machine translation)

-

Paragraph 0040; 0041, (2017/01/02)

PROBLEM TO BE SOLVED: perfluoroalkyl group CF2 groups of 4, 5 or 6 of this compound, a water and oil repellent, mold release agent and an active component of a surface treatment such as a resin or elastomer-like shaped when manufacturing a fluorine-containing polymer, which is effectively used as a polymerizable monomer, a fluorine-containing compound, and a manufacturing method thereof. SOLUTION: the [...]fluorine, vinylidene fluoride n under heating in the presence of or after the reaction, the reaction of a basic compound, fluorine-containing olefin compound is used. Selected drawing: no (by machine translation)

Surface Chemistry and Radiation Chemistry of Trifluoroiodomethane (CF 3I) on Mo(110)

Nakayama, Nozomi,Ferrenz, Elizabeth E.,Ostling, Denise R.,Nichols, Andrea S.,Faulk, Janelle F.,Arumainayagam, Christopher R.

, p. 4080 - 4085 (2007/10/03)

The surface-induced and electron-induced chemistry of trifluoroiodomethane (CF3I), a potential replacement for chlorofluorocarbons (CFCs) and chlorofluorobromocarbons (halons), were investigated under ultrahigh vacuum conditions (p a?? 1 a?? 10-10 Torr) on Mo(110). Results of temperature-programmed desorption (TPD) experiments indicate that dissociative adsorption of CF3I leads only to nonselective decomposition on Mo(110), in contrast to reactions of CF3I on other metal surfaces. Desorption of CF3 radicals and atomic iodine was detected mass spectrometrically during low-energy (10-100 eV) electron irradiation of four monolayer thick films of CF3I condensed at 100 K. Results of postirradiation temperature-programmed desorption experiments were used to identify CF2I2, C2F5I, C 2F6, C2F4I2, and CFI3 as electron-induced reaction products of CF3I. Except for CFI 3, all of these electron-induced reaction products of CF3I have been previously identified in ?3-radiolysis studies, supporting our earlier claim that temperature-programmed desorption experiments conducted following low-energy electron irradiation of multilayer thin films provide an effective method to investigate the effects of high-energy radiation, including radical-radical reactions.

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