13569-32-9Relevant articles and documents
Mechanism of thermal decomposition of allyltrichlorosilane with formation of three labile intermediates: dichlorosilylene, allyl radical, and atomic chlorine
Boganov,Promyslov,Krylova,Zaitseva,Egorov
, p. 1216 - 1224 (2016)
It is experimentally found that allyltrichlorosilane dissociates under vacuum pyrolysis (~10–2 Torr) at temperatures above 1100 K to form three labile intermediates: allyl radical, dichlorosilylene, and monoatomic chlorine. On the basis of experimental and theoretical data obtained, it is shown that the decomposition reaction proceeds in two steps. The first step is a typical reaction of homolytic decomposition to two radicals (C3H5 and SiCl3) at the weakest Si—C bond. Due to weakness of the Si—Cl bond in the SiCl3 radical, the energy of which is even somewhat lower than the dissociation energy of the Si—C bond in starting AllSiCl3, this radical undergoes further dissociation to SiCl2 and Cl, thus resulting in three intermediates of different classes of highly reactive species formed from AllSiCl3.
Chemiluminescent reactions of group IV A atoms with PCl5 and SnCl4
Wang, J.H.,Cheong, B.S.,Fang, C.C.,Parson, J.M.
, p. 7830 - 7835 (1990)
Earlier work to chemiluminescent (CL) reaction of group IV A atoms with halogens has been extended to two chlorine-rich molecules PCl5 and SnCl4.The CL products in these reactions were found to be group IV A dihalides formed in a one step mechanism instead of the two step mechanism proposed in the study of the reactions involving Br2, I2, and ICl.For PCl5. the CL products were found to be group IV A dichlorides, while for SnCl4, the CL products are believed to be SnCl2 for all three atoms.The overall absolute cross sections for the reactions have been estimated, as well as the relative cross sections as functions of collisional energy.The observation of different collisional energy dependence for the reactions of PCl5 and SnCl4, along with other evidence, suggests that two different mechanisms produce the CL products in the two groups of reactions.
Nonclassical complex of dichlorosilylene with CO: direct spectroscopic detection
Boganov, S. E.,Egorov, M. P.,Lalov, A. V.,Promyslov, V. M.,Syroeshkin, M. A.
, p. 1084 - 1092 (2021/07/25)
A complex between SiCl2 and CO of the 1:1 composition with coordination of the silylene to the C atom of carbon monoxide is detected in Ar matrices using FTIR spectroscopy. A positive shift of the ν(CO) band of the complex relative to the corre
Formation of 1,1-dichloro-2-vinyl-1-silacyclopropane by a photoinduced reaction between dichlorosilylene and 1,3-butadiene
Boganov, Sergey E.,Promyslov, Vladimir M.,Rynin, Stanislav S.,Krylova, Irina V.,Egorov, Mikhail P.
, p. 574 - 576 (2018/12/13)
A matrix FTIR study of interaction between SiCl2 and 1,3-butadiene revealed that at low temperatures, it stops at the step of complexation between the reactants. This allowed us to investigate a photochemical version of this interaction resulti
Ion-enhanced etching of Si(100) with molecular chlorine: Neutral and ionic product yields as a function of ion kinetic energy and molecular chlorine flux
Materer,Goodman, Rory S.,Leone, Stephen R.
, p. 3261 - 3266 (2007/10/03)
Time-of-flight mass spectrometry (TOFMS) is used to measure neutral and ionic silicon etch products evolved during argon ion-enhanced etching of room temperature Si(100) with molecular chlorine. The yields of these neutral and ionic etch products are examined as a function of ion energy, ion flux, and molecular chlorine flux. For the neutral products, an Ar+ ion energy range of 275-975 eV is used, while the ionic product measurements are continued down to 60 eY The atomic Si, SiCl, and SiCl2 neutral etch products are measured without complications due to fragmentation by using 118-nm laser single-photon TOFMS. Atomic Si and SiCl are the major observed etch products. The ionic Si+ and SiCl+ etch products are also measured using TOFMS; however, the SiQ2+ species is not observed. The similarities between neutral and ionic Si and SiCl etch products as a function of various parameters suggest a model based on direct collisional desorption. For the observed neutral SiCl2 product, the absence of SiCl2+ suggests a different mechanism than that for Si and SiCl. For SiCl2, formation models based on thermal heating or reaction and desorption of neutral species at chemically active surface sites, which are ruled out for Si and SiCl, should be considered.
The detection of O=SiCl2 as an intermediate during the combustion process of SiCl4 with O2
Junker,Wilkening,Binnewies,Schnockel
, p. 1531 - 1535 (2007/10/03)
During the technical important combustion of SiCl4 with oxygen [SiCl4(g) + O2(g) = SiO2(s) + 2·Cl2(g)] many intermediates have been detected in the past. However, the presence of the primary species O=SiCl2 has been discussed controversially until today. With the help of matrix isolation technique we have now been successful to monitor O=SiCl2 via its IR spectrum. With the help of quantum chemical calculations the thermodynamic data have been calculated first. On this basis it was possible to find the optimal conditions to trap OSiCl2 from the high-temperature equilibrium. Furthermore it could be shown via IR spectroscopy and quantum chemical calculations, that the radical OSiCl does not play a significant role within this combustion process.
Chemiluminescent reactions of ground and metastable states of the group IV a elements with halogens
Wang,Cheong,Parson
, p. 2834 - 2839 (2007/10/02)
Earlier work on chemiluminescent beam-gas reactions of the ground states (3Pj) of Si, Ge, and Sn with F2 and of both ground and metastable states (1D, 1S) of Sn with Cl 2, Br2, and I2 is extended to include reactions of both ground and metastable states of Si, Ge, and Sn with F2, Cl2, Br2, I2, and ICl. Chemiluminescent products of metal halides and/or dihalides were observed in all of these reactions, although attempts to observe that in the similar reactions of Pb were unsuccessful. In ICl reactions with Si, Ge, and Sn, both monochloride and dichloride emission occurs, confirming the previously proposed mechanism for creating dihalide emission in Sn reactions with Br2 and I2 via a monohalide intermediate.
