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7783-42-8

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7783-42-8 Usage

Safety Profile

Moderately toxic by inhalation. A severe irritant to skin, eyes, and mucous membranes. When heated to decomposition or on contact with water or steam it emits highly toxic and corrosive fumes of SOx and F-. See also FLUORIDES.

Check Digit Verification of cas no

The CAS Registry Mumber 7783-42-8 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 7,7,8 and 3 respectively; the second part has 2 digits, 4 and 2 respectively.
Calculate Digit Verification of CAS Registry Number 7783-42:
(6*7)+(5*7)+(4*8)+(3*3)+(2*4)+(1*2)=128
128 % 10 = 8
So 7783-42-8 is a valid CAS Registry Number.
InChI:InChI=1/F2OS/c1-4(2)3

7783-42-8SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 12, 2017

Revision Date: Aug 12, 2017

1.Identification

1.1 GHS Product identifier

Product name THIONYL FLUORIDE

1.2 Other means of identification

Product number -
Other names Sulfur difluoride oxide

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:7783-42-8 SDS

7783-42-8Synthetic route

vanadium pentafluoride
7783-72-4, 44247-54-3

vanadium pentafluoride

sulfur dioxide
7446-09-5

sulfur dioxide

thionyl fluoride
7783-42-8

thionyl fluoride

Conditions
ConditionsYield
byproducts: VOF3; vigorous react.;97.8%
thionyl chloride
7719-09-7

thionyl chloride

fluorine
7782-41-4

fluorine

thionyl fluoride
7783-42-8

thionyl fluoride

Conditions
ConditionsYield
In further solvent(s) fluorination (N2 carrier gas (ratio F/N2 1:5), -50°C, als solvent freon-11);80%
In neat (no solvent) at 0°C under inflammation (pale blue); further oxifluoride formed;;
(trifluoroethenyl)pentafluorosulfur(VI)
1186-51-2

(trifluoroethenyl)pentafluorosulfur(VI)

A

fluorosulfonyl fluoride
640723-20-2, 2699-79-8, 12769-73-2

fluorosulfonyl fluoride

B

bis(pentafluorosulfur)oxide
42310-84-9

bis(pentafluorosulfur)oxide

C

chlorotrifluoromethane
75-72-9

chlorotrifluoromethane

D

difluoro(pentafluorosulfanyl)acetyl fluoride
54555-26-9

difluoro(pentafluorosulfanyl)acetyl fluoride

E

thionyl fluoride
7783-42-8

thionyl fluoride

Conditions
ConditionsYield
With oxygen 25°C, 12 h, further product;A n/a
B n/a
C n/a
D 72%
E n/a
With O2 25°C, 12 h, further product;A n/a
B n/a
C n/a
D 72%
E n/a
With ozone 25°C, 12 h, further product;A n/a
B n/a
C n/a
D 52%
E n/a
With O3 25°C, 12 h, further product;A n/a
B n/a
C n/a
D 52%
E n/a
(1,2-dibromotrifluoroethyl)pentafluorosulfur(VI)
22687-88-3

(1,2-dibromotrifluoroethyl)pentafluorosulfur(VI)

A

fluorosulfonyl fluoride
640723-20-2, 2699-79-8, 12769-73-2

fluorosulfonyl fluoride

B

disulfur decafluoride
5714-22-7

disulfur decafluoride

C

1,2,2-tribromo-1,1,2-trifluoroethane
354-49-4

1,2,2-tribromo-1,1,2-trifluoroethane

D

silicon tetrafluoride
7783-61-1

silicon tetrafluoride

E

thionyl fluoride
7783-42-8

thionyl fluoride

Conditions
ConditionsYield
Irradiation (UV/VIS); irradiated (Hanovia S 500 lamp) in silica ampule, 20 h, further products;A n/a
B n/a
C 49%
D n/a
E n/a
thionyl chloride
7719-09-7

thionyl chloride

1,2,2,2-tetrafluoro-ethanesulfonyl fluoride
2127-74-4

1,2,2,2-tetrafluoro-ethanesulfonyl fluoride

triethylamine
121-44-8

triethylamine

A

thionyl chlorofluoride
14177-25-4

thionyl chlorofluoride

B

1-chlorotetrafluoroethanesulfonyl chloride
25221-39-0

1-chlorotetrafluoroethanesulfonyl chloride

C

thionyl fluoride
7783-42-8

thionyl fluoride

Conditions
ConditionsYield
-70°C;A n/a
B 47%
C n/a
-70°C;A n/a
B 47%
C n/a
chlorine fluorosulfate
13997-90-5

chlorine fluorosulfate

sulfur tetrafluoride
7783-60-0

sulfur tetrafluoride

A

SF4(Cl)OSO2F
88548-62-3, 88588-20-9

SF4(Cl)OSO2F

B

thionyl fluoride
7783-42-8

thionyl fluoride

Conditions
ConditionsYield
In neat (no solvent) ClOSO2F transferred under static vac. to FEP reactor, SF4 condensed andreactor placed in 0°C bath and left for 1.5 h; reactor cooled to -95°C, volatile materials pumped from -95 to -70°C, reactor allowed to warm to room temp., volatile materials pumped into -196°C trap and fractionated, product refractionated through -63°C trap;A 46%
B n/a
bis(pentafluorosulfur) peroxide
12395-41-4

bis(pentafluorosulfur) peroxide

sulfur dioxide
7446-09-5

sulfur dioxide

A

thionyl tetrafluoride
173009-97-7, 118492-84-5, 13709-54-1

thionyl tetrafluoride

B

pentafluorosulfur fluorosulfonate
81439-35-2

pentafluorosulfur fluorosulfonate

C

sulfur trioxide
7446-11-9

sulfur trioxide

D

thionyl fluoride
7783-42-8

thionyl fluoride

E

sulphur hexafluoride
2551-62-4

sulphur hexafluoride

Conditions
ConditionsYield
byproducts: SiF4, sulfur; other Radiation; photochemical reaction with 253.7 nm radiation, 48 h;A n/a
B 45%
C n/a
D n/a
E n/a
thiocyanogen
505-14-6

thiocyanogen

fluorine
7782-41-4

fluorine

A

thiazyl trifluoride
15930-75-3

thiazyl trifluoride

B

sulphur cyanide pentafluoride
1512-13-6

sulphur cyanide pentafluoride

C

sulfur tetrafluoride
7783-60-0

sulfur tetrafluoride

D

thionyl fluoride
7783-42-8

thionyl fluoride

E

sulphur hexafluoride
2551-62-4

sulphur hexafluoride

Conditions
ConditionsYield
In further solvent(s) byproducts: (FCN)3; reactn. of a soln. of dirhodane in FCl2C-CClF2 with diluted F2 (F2:N2 0 1:10); cooled down to -183°C; solvent removed by condensation; mixt. condensed to aq. KOH-soln. at room temp. to remove SF4, SOF and (FCN)3; sepn. by fractionated condensation at -127°C, -140°C, -196°C;A 8%
B 5%
C 30%
D 40%
E 3%
nitrogen trifluoride
7783-54-2

nitrogen trifluoride

sulfur trioxide
7446-11-9

sulfur trioxide

A

fluorosulfonyl fluoride
640723-20-2, 2699-79-8, 12769-73-2

fluorosulfonyl fluoride

B

2NO(1+)*S2O5F4(2-)=(NO)2S2O5F4

2NO(1+)*S2O5F4(2-)=(NO)2S2O5F4

C

thionyl fluoride
7783-42-8

thionyl fluoride

D

sulphur hexafluoride
2551-62-4

sulphur hexafluoride

Conditions
ConditionsYield
byproducts: NO, NO2; 520 °C, nickel tube;A 30%
B n/a
C 4%
D <1
potassium fluoride

potassium fluoride

S8(2+)*2AsF6(1-) = S8(AsF6)2

S8(2+)*2AsF6(1-) = S8(AsF6)2

thionyl fluoride
7783-42-8

thionyl fluoride

Conditions
ConditionsYield
In liquid sulphur dioxide15%
N-(pentafluorosulfanyl)-(dichloro)methanimide
1801-00-9

N-(pentafluorosulfanyl)-(dichloro)methanimide

A

Schwefelpentafluorid-isocyanid
804533-76-4

Schwefelpentafluorid-isocyanid

B

thionyl fluoride
7783-42-8

thionyl fluoride

Conditions
ConditionsYield
With P(i-Pr)3 In neat (no solvent) byproducts: 2-fluoro-propane, SOF2; all manipulations in dry evacuated apparatus; S and P compds. added through septum into liq. N2 cooled apparatus; trap at -196°C contained F5SNC, other compds. in trap at -120°C;A 10%
B n/a
With tris(2-octyl) phosphite In neat (no solvent) byproducts: SOF2; all manipulations in dry evacuated apparatus under Ar; S and P compds. added through septum into liq. N2 cooled apparatus then allowed to warm very slowly with stirring; trap at -196°C contained F5SNC, other compds. in trap at -100°C and -78°C;
thionyl chloride
7719-09-7

thionyl chloride

thiazyl trifluoride
15930-75-3

thiazyl trifluoride

hydrogen fluoride
7664-39-3

hydrogen fluoride

A

SF5N=SCl2
25502-15-2

SF5N=SCl2

B

((pentafluorosulfanyl)imino)chlorofluorosulfane
80997-19-9

((pentafluorosulfanyl)imino)chlorofluorosulfane

C

thionyl fluoride
7783-42-8

thionyl fluoride

Conditions
ConditionsYield
HF and NSF3 were condesed in Kel-F reactor at -196°C, allowed toreact at room temp. overnight, SOCl2 added, reacted at room temp. for 2weeks and volatile products were condensed into a NaF scrubber; fractionation through a series of traps at -10, -78, and -196°C in vac., a -78°C trap contained the product, distillation;A 9.6%
B <1
C n/a
HF and NSF3 were condesed in steel cylinder at -196°C, allowed to react at room temp. for 1 h, SOCl2 added, heated at 79°C for 24h and volatile products were condensed into a NaF scrubber; fractionation through a series of traps at -10, -78, and -196°C in vac., a -78°C trap contained the product, distillation;A 2%
B n/a
C n/a
dinitrogen difluoride
10578-16-2

dinitrogen difluoride

sulfur dioxide
7446-09-5

sulfur dioxide

A

fluorosulfonyl anhydride
13036-75-4

fluorosulfonyl anhydride

B

fluorosulfonyl fluoride
640723-20-2, 2699-79-8, 12769-73-2

fluorosulfonyl fluoride

C

thionyl tetrafluoride
173009-97-7, 118492-84-5, 13709-54-1

thionyl tetrafluoride

D

thionyl fluoride
7783-42-8

thionyl fluoride

Conditions
ConditionsYield
byproducts: N2O, N2;
dinitrogen difluoride
10578-16-2

dinitrogen difluoride

sulfur dioxide
7446-09-5

sulfur dioxide

A

fluorosulfonyl fluoride
640723-20-2, 2699-79-8, 12769-73-2

fluorosulfonyl fluoride

B

fluorosulfonylchloride
13637-84-8

fluorosulfonylchloride

C

thionyl fluoride
7783-42-8

thionyl fluoride

Conditions
ConditionsYield
With chlorin byproducts: S2O5F2, SOF4, N2O, N2; 100°C, 1.5 h, in autoclave;
dinitrogen difluoride
10578-16-2

dinitrogen difluoride

sulfur dioxide
7446-09-5

sulfur dioxide

A

fluorosulfonyl fluoride
640723-20-2, 2699-79-8, 12769-73-2

fluorosulfonyl fluoride

B

thionyl fluoride
7783-42-8

thionyl fluoride

Conditions
ConditionsYield
byproducts: S2O5F2, SOF4, N2O, N2; 100°C, 1.5 h, in autoclave;
hypofluorous acid trifluoromethyl ester
373-91-1

hypofluorous acid trifluoromethyl ester

sulfur dioxide
7446-09-5

sulfur dioxide

A

fluorosulfonyl fluoride
640723-20-2, 2699-79-8, 12769-73-2

fluorosulfonyl fluoride

B

Trifluormethyl-fluordisulfat

Trifluormethyl-fluordisulfat

C

Bis-(trifluormethyl)-sulfat
1479-52-3

Bis-(trifluormethyl)-sulfat

D

trifluoromethanesulfonyl hypofluorite

trifluoromethanesulfonyl hypofluorite

E

thionyl fluoride
7783-42-8

thionyl fluoride

Conditions
ConditionsYield
byproducts: CO2; 170-180°C, further products; fractionated distn.;
difluoroether
7783-41-7

difluoroether

hydrogen sulfide
7783-06-4

hydrogen sulfide

A

sulfur
7704-34-9

sulfur

B

thionyl fluoride
7783-42-8

thionyl fluoride

Conditions
ConditionsYield
byproducts: S, HF; 12 h, room temp.;
byproducts: S, HF; 12 h, room temp.;
sodium thiosulfate

sodium thiosulfate

A

fluorosulfonyl fluoride
640723-20-2, 2699-79-8, 12769-73-2

fluorosulfonyl fluoride

B

sodium fluoride

sodium fluoride

C

sodium sulfate
7757-82-6

sodium sulfate

D

thionyl fluoride
7783-42-8

thionyl fluoride

E

sulphur hexafluoride
2551-62-4

sulphur hexafluoride

Conditions
ConditionsYield
With fluorine byproducts: O2; -80°C;
With F2 byproducts: O2; -80°C;
sulfur dioxide
7446-09-5

sulfur dioxide

tetramethylammonium fluoride
373-68-2

tetramethylammonium fluoride

nitrosonium tetrafluoroborate

nitrosonium tetrafluoroborate

A

nitrogen
7727-37-9

nitrogen

B

fluorosulfate(1-)

fluorosulfate(1-)

C

thionyl fluoride
7783-42-8

thionyl fluoride

Conditions
ConditionsYield
In liquid sulphur dioxide
In sulfur dioxide
sulfur tetrafluoride
7783-60-0

sulfur tetrafluoride

sulfur dioxide
7446-09-5

sulfur dioxide

thionyl fluoride
7783-42-8

thionyl fluoride

Conditions
ConditionsYield
50-150°C;
50-150°C;
sulfur dioxide
7446-09-5

sulfur dioxide

phosphorus pentafluoride
7647-19-0, 874483-74-6

phosphorus pentafluoride

thionyl fluoride
7783-42-8

thionyl fluoride

Conditions
ConditionsYield
With trifluorophosphoric acid other Radiation; CO2-laser radiation; react. rate increased by Xe or Kr, decreased by He, Ne, Ar;
pentafluorosulfanyl chloride
13780-57-9

pentafluorosulfanyl chloride

sulfur dioxide
7446-09-5

sulfur dioxide

A

sulfuryl dichloride
7791-25-5

sulfuryl dichloride

B

fluorosulfonyl fluoride
640723-20-2, 2699-79-8, 12769-73-2

fluorosulfonyl fluoride

C

disulfur decafluoride
5714-22-7

disulfur decafluoride

D

pentafluorosulfur fluorosulfonate
81439-35-2

pentafluorosulfur fluorosulfonate

E

thionyl fluoride
7783-42-8

thionyl fluoride

Conditions
ConditionsYield
byproducts: SiF4; other Radiation; photochemical reaction with 253.7 nm radiation, 48 h, in glass vessel;A n/a
B n/a
C <1
D n/a
E n/a
sulfur dioxide
7446-09-5

sulfur dioxide

sulphur hexafluoride
2551-62-4

sulphur hexafluoride

A

fluorosulfonyl fluoride
640723-20-2, 2699-79-8, 12769-73-2

fluorosulfonyl fluoride

B

sulfur tetrafluoride
7783-60-0

sulfur tetrafluoride

C

thionyl fluoride
7783-42-8

thionyl fluoride

Conditions
ConditionsYield
Kinetics; other Radiation; no react. on mere heating at 627 °C, but induction by CO2-laser;
sulfur dioxide
7446-09-5

sulfur dioxide

tungsten(VI) fluoride
7783-82-6

tungsten(VI) fluoride

A

tungsten oxide tetrafluoride
13520-79-1, 52049-91-9

tungsten oxide tetrafluoride

B

thionyl fluoride
7783-42-8

thionyl fluoride

Conditions
ConditionsYield
In liquid sulphur dioxide 20°C;
disulfur decafluoride
5714-22-7

disulfur decafluoride

sulfur dioxide
7446-09-5

sulfur dioxide

A

fluorosulfonyl fluoride
640723-20-2, 2699-79-8, 12769-73-2

fluorosulfonyl fluoride

B

pentafluorosulfur fluorosulfonate
81439-35-2

pentafluorosulfur fluorosulfonate

C

sulfur trioxide
7446-11-9

sulfur trioxide

D

thionyl fluoride
7783-42-8

thionyl fluoride

E

sulphur hexafluoride
2551-62-4

sulphur hexafluoride

Conditions
ConditionsYield
byproducts: SiF4, sulfur; other Radiation; photochemical reaction with 253.7 nm radiation, in glass vessel;
sulfur tetrafluoride
7783-60-0

sulfur tetrafluoride

sulfur trioxide
7446-11-9

sulfur trioxide

A

fluorosulfonyl anhydride
13036-75-4

fluorosulfonyl anhydride

B

fluorosulfonyl fluoride
640723-20-2, 2699-79-8, 12769-73-2

fluorosulfonyl fluoride

C

thionyl fluoride
7783-42-8

thionyl fluoride

Conditions
ConditionsYield
50-150 °C, exclusion of oxygen, SO3:SF4 = 1:2;
50-150 °C, exclusion of oxygen, SO3:SF4 = 1:2;
hydrogen fluoride
7664-39-3

hydrogen fluoride

hydrogen sulfide
7783-06-4

hydrogen sulfide

A

fluorosulfonyl fluoride
640723-20-2, 2699-79-8, 12769-73-2

fluorosulfonyl fluoride

B

sulfur tetrafluoride
7783-60-0

sulfur tetrafluoride

C

thionyl fluoride
7783-42-8

thionyl fluoride

Conditions
ConditionsYield
With potassium fluoride; water In hydrogen fluoride Electrochem. Process; 5% KF, in presence of moisture, electrofluorination;
With water; sodium fluoride In hydrogen fluoride Electrochem. Process; 5% NaF, in presence of moisture, electrofluorination;
With NaF; H2O In hydrogen fluoride HF (liquid); Electrochem. Process; 5% NaF, in presence of moisture, electrofluorination;
With KF; H2O In hydrogen fluoride HF (liquid); Electrochem. Process; 5% KF, in presence of moisture, electrofluorination;
thionyl chloride
7719-09-7

thionyl chloride

zinc(II) fluoride

zinc(II) fluoride

thionyl fluoride
7783-42-8

thionyl fluoride

Conditions
ConditionsYield
In neat (no solvent)
In neat (no solvent)
sulfur tetrafluoride
7783-60-0

sulfur tetrafluoride

sodium nitrite
7632-00-0

sodium nitrite

A

thionyl tetrafluoride
173009-97-7, 118492-84-5, 13709-54-1

thionyl tetrafluoride

B

N2O3SF5

N2O3SF5

C

thionyl fluoride
7783-42-8

thionyl fluoride

Conditions
ConditionsYield
byproducts: SF6; 200-300°C, 2-8 h;
byproducts: SF6; 200-300°C, 2-8 h;
sodium nitrate
7631-99-4

sodium nitrate

sulfur tetrafluoride
7783-60-0

sulfur tetrafluoride

A

fluorosulfonyl fluoride
640723-20-2, 2699-79-8, 12769-73-2

fluorosulfonyl fluoride

B

thionyl tetrafluoride
173009-97-7, 118492-84-5, 13709-54-1

thionyl tetrafluoride

C

sodium fluoride

sodium fluoride

D

thionyl fluoride
7783-42-8

thionyl fluoride

E

sulphur hexafluoride
2551-62-4

sulphur hexafluoride

Conditions
ConditionsYield
byproducts: N2, NO; 200 - 300°C, 8 h; content of formed gas mixture: 27 vol.-% SOF4, 27 vol.-% SOF2, 5.2 vol.-% SF6, 1 vol.-% SO2F2, 35 vol.-% N2, 1 vol.-% NO;
byproducts: N2, NO; 200 - 300°C, 8 h; content of formed gas mixture: 27 vol.-% SOF4, 27 vol.-% SOF2, 5.2 vol.-% SF6, 1 vol.-% SO2F2, 35 vol.-% N2, 1 vol.-% NO;
chlorine monofluoride
7790-89-8

chlorine monofluoride

thionyl fluoride
7783-42-8

thionyl fluoride

pentafuorosulfanyl hypochlorite
22675-70-3

pentafuorosulfanyl hypochlorite

Conditions
ConditionsYield
cesium fluoride In neat (no solvent) absence of air and moisture; activating CsF (in stainless-steel autoclave passivated with F2) with SO2 followed by vac. pyrolysis, condensing SOF2 and excess ClF at -196°C, wrming to -40°C, standing for1 d; fractional low-temp. distn. (condensing at -120°C);99%
tetramethylammonium fluoride
373-68-2

tetramethylammonium fluoride

thionyl fluoride
7783-42-8

thionyl fluoride

tetramethylammonium trifluorosulfite

tetramethylammonium trifluorosulfite

Conditions
ConditionsYield
In neat (no solvent) Sonication; absence of air and moisture; condensing excess SOF2 onto Me4NF at -196°C, warming to room temp., placing in ultrasonic bath for few h; pumping off excess SOF2 (dry ice temp.);99%
In acetonitrile absence of air and moisture;
chlorosulfonic acid
7790-94-5

chlorosulfonic acid

aminosulfonic acid
5329-14-6

aminosulfonic acid

thionyl fluoride
7783-42-8

thionyl fluoride

bis(fluorosulfonyl)amide
14984-73-7

bis(fluorosulfonyl)amide

Conditions
ConditionsYield
In 1,2-dichloro-ethane at 80℃; under 16501.7 Torr; for 17h; Solvent; Autoclave;77%

7783-42-8Relevant articles and documents

Vanadium, niobium and tantalum complexes with terminal sulfur radical ligands

Chen, Xiuting,Gong, Yu,Hu, Jingwen,Wei, Rui

, p. 11300 - 11306 (2021)

Sulfur radicals terminally bound to the metal center can be considered as the one-electron reduction products of complexes with terminal sulfido ligands which serve as the reactive sites in enzymes and precursors. However, there is limited information regarding this kind of metal stabilized sulfur radical, which contrasts the more commonly known metal stabilized thiyl radical. In this work, we report the preparation of vanadium, niobium and tantalum radical complexes in the form of M(O)(S)F2 from the reactions of laser-ablated metal atoms and SOF2 in cryogenic matrixes. Combined with the results from infrared spectroscopy and density functional theory calculations, the sulfur ligand in M(O)(S)F2 is characterized to be a terminally bound radical with the unpaired electron located on the sulfur 3p orbital. Besides this radical complex, calculations also predict the existence of MF2(η2-SO) with a side-on SO ligand, but this less stable isomer is not observed as a result of high exothermicity along with its formation from metal atoms and SOF2 that is large enough to overcome the energy barrier towards the occurrence of M(O)(S)F2.

Rapid and column-free syntheses of acyl fluorides and peptides usingex situgenerated thionyl fluoride

Lee, Cayo,Sammis, Glenn M.,Thomson, Brodie J.

, p. 188 - 194 (2021/12/31)

Thionyl fluoride (SOF2) was first isolated in 1896, but there have been less than 10 subsequent reports of its use as a reagent for organic synthesis. This is partly due to a lack of facile, lab-scale methods for its generation. Herein we report a novel protocol for theex situgeneration of SOF2and subsequent demonstration of its ability to access both aliphatic and aromatic acyl fluorides in 55-98% isolated yields under mild conditions and short reaction times. We further demonstrate its aptitude in amino acid couplings, with a one-pot, column-free strategy that affords the corresponding dipeptides in 65-97% isolated yields with minimal to no epimerization. The broad scope allows for a wide range of protecting groups and both natural and unnatural amino acids. Finally, we demonstrated that this new method can be used in sequential liquid phase peptide synthesis (LPPS) to afford tri-, tetra-, penta-, and decapeptides in 14-88% yields without the need for column chromatography. We also demonstrated that this new method is amenable to solid phase peptide synthesis (SPPS), affording di- and pentapeptides in 80-98% yields.

Multidimensional SuFEx Click Chemistry: Sequential Sulfur(VI) Fluoride Exchange Connections of Diverse Modules Launched From An SOF4 Hub

Li, Suhua,Wu, Peng,Moses, John E.,Sharpless, K. Barry

supporting information, p. 2903 - 2908 (2017/03/13)

Sulfur(VI) fluoride exchange (SuFEx) is a new family of click chemistry based transformations that enable the synthesis of covalently linked modules via SVI hubs. Here we report thionyl tetrafluoride (SOF4) as the first multidimensional SuFEx connector. SOF4 sits between the commercially mass-produced gases SF6 and SO2F2, and like them, is readily synthesized on scale. Under SuFEx catalysis conditions, SOF4 reliably seeks out primary amino groups [R-NH2] and becomes permanently anchored via a tetrahedral iminosulfur(VI) link: R?N=(O=)S(F)2. The pendant, prochiral difluoride groups R?N=(O=)SF2, in turn, offer two further SuFExable handles, which can be sequentially exchanged to create 3-dimensional covalent departure vectors from the tetrahedral sulfur(VI) hub.

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