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Tetramethylgermane is a colorless to slightly yellow liquid that serves as a Chemical Vapor Deposition (CVD) precursor to germanium oxide thin films.

865-52-1

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865-52-1 Usage

Uses

Used in Electronics Industry:
Tetramethylgermane is used as a CVD precursor for the deposition of germanium oxide thin films, which are essential for the fabrication of electronic devices and components.
Used in Optoelectronics Industry:
Tetramethylgermane is used as a CVD precursor for the growth of germanium oxide thin films in optoelectronic devices, such as solar cells and photodetectors, due to their desirable optical and electronic properties.
Used in Semiconductor Industry:
Tetramethylgermane is used as a CVD precursor for the formation of germanium oxide thin films in semiconductor devices, contributing to improved device performance and reliability.

Check Digit Verification of cas no

The CAS Registry Mumber 865-52-1 includes 6 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 3 digits, 8,6 and 5 respectively; the second part has 2 digits, 5 and 2 respectively.
Calculate Digit Verification of CAS Registry Number 865-52:
(5*8)+(4*6)+(3*5)+(2*5)+(1*2)=91
91 % 10 = 1
So 865-52-1 is a valid CAS Registry Number.
InChI:InChI=1/C4H12Ge/c1-5(2,3)4/h1-4H3

865-52-1 Well-known Company Product Price

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  • Alfa Aesar

  • (A16931)  Tetramethylgermanium, 98%   

  • 865-52-1

  • 5g

  • 581.0CNY

  • Detail
  • Alfa Aesar

  • (A16931)  Tetramethylgermanium, 98%   

  • 865-52-1

  • 25g

  • 2539.0CNY

  • Detail
  • Aldrich

  • (396354)  Tetramethylgermanium  98%

  • 865-52-1

  • 396354-5G

  • 1,593.54CNY

  • Detail

865-52-1SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 12, 2017

Revision Date: Aug 12, 2017

1.Identification

1.1 GHS Product identifier

Product name Tetramethylgermanium

1.2 Other means of identification

Product number -
Other names Germane, tetramethyl-

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:865-52-1 SDS

865-52-1Relevant academic research and scientific papers

Compounds of Group 14 Elements with an Element-Element (E = Si, Ge, Sn) Bond: Effect of the Nature of the Element Atom

Zaitsev, Kirill V.,Lermontova, Elmira Kh.,Churakov, Andrei V.,Tafeenko, Viktor A.,Tarasevich, Boris N.,Poleshchuk, Oleg Kh.,Kharcheva, Anastasia V.,Magdesieva, Tatiana V.,Nikitin, Oleg M.,Zaitseva, Galina S.,Karlov, Sergey S.

, p. 2765 - 2774 (2015/06/30)

Two series of germanium compounds, (p-Tol)3Ge-MMe3 (M = Si (1), Ge (2), Sn (3)) and (Me3Si)3Ge-MPh3 (M = Ge (4), Sn (5)), were prepared using lithium or potassium intermediates. The changing of the reaction conditions results in trigermane Ph3Ge-Ge(SiMe3)2-GePh3 (6). The molecular structures of 1, 2, and 6 were investigated by X-ray analysis. By UV/visible spectroscopy it is established that introduction of a tin atom results in a significant bathochromic absorption shift. Furthermore, according to cyclic voltammetry, oxidation potentials decrease in the order 1 > 2 > 3. The electronic structures of 1-4 and related (Me3Si)3Ge-SiPh3 were investigated by DFT calculations. Fluorescence properties of 1-3 were studied in the solid state and in solution; for compound 3 phosphorescence (lifetime is 4.58 ms) is observed in the solid state. (Graph Presented).

Formation of silicon-carbon bonds by photochemical irradiation of (η5-C5H5)Fe(CO)2SiR3 and (η5-C5H5)Fe(CO)2Me to Obtain R3SiMe

Fortier, Skye,Zhang, Yongqiang,Sharma, Hemant K.,Pannell, Keith H.

, p. 1041 - 1044 (2010/04/25)

Photochemical irradiation of an equimolar mixture of (η5 -C5H5)Fe(CO)2SiR3, FpSiR 3, and FpMe leads to the efficient formation of the silicon-carbon-coupled product R3SiMe, R3 = Me 3, Me2Ph, MePh2, Ph3, ClMe 2, Cl2Me, Cl3, Me2Ar (Ar = C 6H4-p-X, X = F, OMe, CF3, NMe2). Similar chemistry occurs with related germyl and stannyl complexes at slower rates, Si > Ge Sn. Substitution of an aryl hydrogen to form FpSiMe2C6H4-p-X has little effect on the rate of the reaction, whereas progressive substitution of methyl groups on silicon by Cl slows the process. Also, changing FpMe to FpCH2SiMe3 dramatically slows the reaction as does the use of (η5-C 5Me5)Fe(CO)2 derivatives. A mechanism involving the initial formation of the 16e intermediate (η5-C 5H5)Fe(CO)Me followed by oxidative addition of the Fe-Si bond accounts for the experimental results obtained.

Method of preparing organometallic compounds

-

Page/Page column 7-8, (2009/02/11)

A method of preparing an ultra-pure organometallic compound comprising using a microchannel device for synthesis in reacting a metal halide with an alkylating agent to produce an ultra-pure alkylmetal compound for processes such as chemical vapor deposition.

Process for the preparation of group IVA and group VIA compounds

-

Page 11-12, (2008/06/13)

Methods of preparing Group IVA and Group VIA organometallic compounds, particularly Group IVA organometallic compounds, are provided. Such manufacturing methods employ an amine and/or phosphine catalyst in a transalkylation step and may be performed in a batch, semi-continuous or continuous manner.

Thermal decomposition of platinum(IV)-silicon, -germanium, and -tin complexes

Levy, Christopher J.,Puddephatt, Richard J.

, p. 4115 - 4120 (2008/10/08)

The thermal decomposition of a number of complexes of the type [PtMe2(Me3E)X(diimine)] (E = Si, Ge, Sn; X = Cl, Br, I) has been studied. The thermal stability of complexes, as determined by thermogravimetric analysis (TGA), varies depending on the diimine ligand in the order 2,2′-bipyridyl (bpy) > 4,4′-di-tert-butyl-2,2′-bipyridyl (bpy-tbu2) > N-(2-(dimethylamino)ethyl)pyridine-2-aldimine (paen-me2) > (2-imino-n-propyl)pyridine (py-n-pr). Stability also varies according to the trends E = Sn ≈ Ge > Si and X = I > Br > Cl. The products of thermal decomposition have also been determined by 1H NMR and three distinct modes of decomposition are evident: reductive elimination of Me3EX, reductive elimination of Me4E, and α-elimination of Me2E. The competition between reductive elimination of Me3EX and Me4E depends primarily on the halide, X, with the ratio Me3EX:Me4E highest for X = Cl and lowest for X = I. The competition between reductive elimination and α-elimination depends primarily on E, with the tendency to α-elimination of Me2E increasing as E = Si 2(Me3Si)(bpy)] as 233 ± 14 kJ mol-1.

Reactivity of dianionic hexacoordinate germanium complexes toward organometallic reagents. A new route to organogermanes

Cerveau,Chuit,Corriu,Reyé

, p. 1510 - 1515 (2008/10/08)

Lithium and potassium tris(benzene-1,2-diolato)germanates (2a and 2b, respectively) and potassium tris(butane-2,3-diolato)germanate (3) are easily prepared from GeO2 in quantitative yields. They are very reactive toward organometallic reagents, the reactivity depending on the ligands on the germanium. Complexes 2 react with an excess of Grignard reagent to give the corresponding tetraorganogermanes R4Ge while the less reactive complex 3 leads to the functional triorganogermanes R3GeX. Tetraorganogermanes can also be prepared from complex 2b by reaction with organic bromides in the presence of Mg (Barbier reaction). The influence of Cp2TiCl2 and MgBr2 on the reactivity of Grignard reagents with these complexes was also investigated: in both cases formation of triorganogermanes was favored.

Bis(dimethylgermyl)alkane-iron tetracarbonyls: Synthesis, photolysis, and reactivity

Barrau, Jacques,Hamida, Najib Ben,Agrebi, Abdelhamid,Satge, Jacques

, p. 1585 - 1593 (2008/10/08)

This work concerns the synthesis, spectroscopic analysis, and reactivity of tetracarbonyliron bis(dimethylgermyl)alkanes Me2Ge(CH2)nGe(Me2)Fe(CO)4 (n = 1, 2). These heterocycles are obtained by cyclization of bis(dimethylgermyl)alkanes Me2HGe(CH2)nGeHMe2 (n = 1, 2) with Fe(CO)5 under UV irradiation. They are stable at room temperature, but the heterocycle with n = 1 decomposes under prolonged UV irradiation with formation of the heterocycle with n = 2, perhydrotetragermin, and (CO)3Fe(μ-GeMe2)3Fe(CO)3. Various CO substitution reactions with phosphines and cleavage reactions with organic and organometallic halides are described; they provide a convenient procedure for the generation of germanium or tin-carbonyl iron clusters. Reactions of tetracarbonyliron bis(dimethylgermyl)methane with sulfur and with oxygen presumably lead first to the dithia- (or dioxa-) digermolane Me2GeCH2Ge(Me2)Y-Y (Y = S or O) and after, by sulfur (or oxygen) loss, to thia- (or oxa-) digermetane Me2GeCH2GeMe2Y (Y = S or O), which are unstable, giving products suggestive of Me2GeY (Y = O or S) and Me2Ge=CH2 intermediates.

Chemistry of heavy carbene analogues R2M (M = Si, Ge, Sn). 12. Concerted and nonconcerted insertion reactions of the germylene Me2Ge into the carbon-halogen bond

K?cher, Jürgen,Lehnig, Manfred,Neumann, Wilhelm P.

, p. 1201 - 1207 (2008/10/08)

During the reaction of Me2Ge with CCl3X (X = Cl, Br), PhCH2X (X = Br, I), and Ph2CHCl, 1H CIDNP is observed in the products of net insertion of Me2Ge into the carbon-halogen bond and in Me2GeX2 (X = Cl, Br). It is concluded that a two-step radical reaction takes place by an abstraction-recombination mechanism. No reaction takes place with alkyl halides that have a C-X bond dissociation energy of more than about 70 kcal/mol. Me2Ge is generated thermally at 70-95°C or photochemically from the 7-germabenzonorbornadiene 1 and reacts in both cases in the singlet state. The activation energy for forming Me2Ge from 1 is 19 kcal/mol for the reaction with CCl4. Insertion products are also formed with the alkenyl halides CH2=CHCH2X, PhCH=CHX (X = Cl, Br), and 2-bromobut-2-ene, but without showing CIDNP effects. Since Me2GeX2 was not found either, Me2Ge reacts in these cases in a nonradical manner. It does not react with 1-chlorocyclohexene, but it does react with Me2GeX2 under formation of digermanes and/or oligogermanes without CIDNP.

Thermolyse, pyrolyse et photolyse d'heterocycles germanies et soufres a 4 et 5 chainons: especes intermediaires a germanium doublement lie

Barrau, J.,Rima, G.,El-Amine, M.,Satge, J.

, p. 39 - 50 (2007/10/02)

The thermolysis, pyrolysis and photolysis of thiagermetane , dithiagermolane and thiagermetane dioxide have been studied.Thiagermetane and dithiagermolane decompose leading to various new germylated heterocycles: , and probably proceed by two competitive mechanisms which involve the transient species germaethene , germathione , thiagermirane and thiadigermetane .Pyrolysis of thiagermetane dioxide also involves germaethene and probably a new doubly-bonded germanium species, the germasulfene (by mass spectroscopy), which finally gives germoxanes (Me2GeO)n (n = 3,4).

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