CHROMIUM SILICIDE (cas 12018-09-6) film on ceramic substrate for pressure measurement

Add time:07/31/2019    Source:sciencedirect.com

In this paper we present a device, based on amorphous silicon technology, fabricated on ceramic substrate able to perform pressure measurement with both good linearity and sensitivity. The active material of the sensor is a thin film (below 5 nm) of CHROMIUM SILICIDE (cas 12018-09-6) formed at room temperature on an n-type amorphous silicon layer. Sensors with different shapes (square and rectangular) and positions on the ceramic membrane have been characterized. Sensitivity in the order of 400 μV/kPa has been achieved.

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