Role of the Trichlorosilyl radical (cas 19165-34-5) and dichlorosilylene in gas-phase reactions of trichlorosilane

Add time:07/25/2019    Source:sciencedirect.com

Cothermolytic reactions of trichlorosilane with chlorobenzene and 1,3-butadiene as well as partial thermolysis of HSiCl3 were studied to estimate the importance of SiCl2, compared to SiCl3, in such reactions. It is shown that SiCl2, may be formed at a temperature of 670°C via recombination of SiCl3 and α-elimination from Si2Cl6, while direct formation by a monomolecular α-elimination from HSiCl3 starts at higher temperatures (above 800–1OOO°C) only. Rapid trapping of SiCl3 in copyrolyses suppresses SiCl2 formation as indicated by the product distribution.

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