Gas inlet and input power modulated sputtering MOLYBDENUM NITRIDE (cas 12033-19-1) thin films

Add time:07/29/2019    Source:sciencedirect.com

The MOLYBDENUM NITRIDE (cas 12033-19-1) films were fabricated by RF magnetron sputtering with various structural features by input power and gas flow ratio modulation. With Ar/N2 gas flow ratios from 10/10 to 18/2 and RF input powers from 150 to 300 W, the molybdenum nitride films evolved from significant crystalline to amorphous features. The coating deposited at an Ar/N2 ratio of 16/4 and an input power of 300 W showed an intensified Mo2N microstructure with preferred (111) orientation. In comparison, the crystalline phase of the coating was suppressed when an Ar/N2 ratio of 10/10 and an input power of 150 W were applied. The thickness, deposition rate and crystallinity of the molybdenum nitride increased with Ar/N2 ratio and power input. The crystalline and amorphous monolayers were alternately stacked to form multilayered films. The correlation between structural evolution and mechanical behavior, such as hardness, Young's modulus, and scratch characteristics of the molybdenum nitride multilayer films was discussed.

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