Regular ArticleElectron-beam exposure of self-assembled monolayers of 10-Undecenoic acid (cas 112-38-9)

Add time:08/27/2019    Source:sciencedirect.com

Tapping mode atomic force microscopy and capacitance versus voltage measurements were employed to study the effects of electron-beam exposure on self-assembled monolayers of 10-undecenoic acid. It was established that exposure increases chemical/mechanical stability, resulting in a thicker layer following a solvent treatment designed to remove residual monomers. Electron exposure also reduces the effects of pinholes in the monolayer, thereby improving dielectric quality.

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